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Characteristics of Cu film-like deposited by using VLPPS

机译:VLPPS沉积的铜膜状特性

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Cu coatings were obtained by the VLPPS (Very Low Pressure Plasma Spray) process using a torch F4-VB. The tank pressure was varied from 1 mbar to 5 mbar: these specific conditions can allow obtaining a higher vapor condensation fraction in the coating. Different sizes of powders are used to compare the vaporization level. The other possible influencing factors for obtaining compact film-like coating are also considered such as the distance between the torch and substrate, the orientation of the vapors and also the substrate temperatures. Microstructures of coatings are analyzed and combined with the results of plasma diagnostics. Jobin-Yvon spectrometer (type TRIAX190, UK) and Plasus Specline Spectroscopy software are both used for detecting and analyzing plasma spectrum data. The value of plasma electronic excited temperature Te was calculated through choosing Hα and Hβ two atom spectra. The results showed that the plasma belongs to cold plasma in the local thermodynamic equilibrium situation in VLPPS.
机译:使用喷枪F4-VB通过VLPPS(超低压等离子喷涂)工艺获得铜涂层。储罐压力在1 mbar到5 mbar之间变化:这些特定条件可以允许在涂层中获得更高的蒸汽冷凝分数。使用不同尺寸的粉末比较汽化水平。还考虑了获得致密膜状涂层的其他可能的影响因素,例如割炬和基材之间的距离,蒸汽的方向以及基材温度。分析涂层的微观结构,并将其与等离子体诊断结果结合起来。 Jobin-Yvon光谱仪(英国TRIAX190型)和Plasus Specline Spectroscopy软件均用于检测和分析血浆光谱数据。通过选择Hα和Hβ两个原子光谱来计算等离子体电子激发温度Te的值。结果表明,在VLPPS局部热力学平衡情况下,等离子体属于冷等离子体。

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