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首页> 外文期刊>Diamond and Related Materials >Ar-dilution effects on the elastic and structural properties of hydrogenated hard carbon films deposited by plasma-enhanced chemical vapor deposition
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Ar-dilution effects on the elastic and structural properties of hydrogenated hard carbon films deposited by plasma-enhanced chemical vapor deposition

机译:Ar稀释对通过等离子体增强化学气相沉积法沉积的氢化硬碳膜的弹性和结构性能的影响

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摘要

Results of systematic investigations of the elastic and structural properties of hydrogenated amorphous carbon (a-C:H) films as a function of deposition conditions are reported. A multi-technique approach has been adopted, combining Brillouin light scattering (BLS), Raman spectroscopy and X-ray reflectivity (XRR). The mass density of the films has been determined by XRR, while BLS has been adopted to test the elastic properties of the films. As the fraction of methane in the feed gas is increased, the deposited film shows both a higher phase velocity of the surface Rayleigh wave, and an increasing density, thus suggesting the synthesis of a harder material. This hardening effect has been attributed to the occurrence of a higher degree of structural order in the sp~2 lattice, as suggested by Raman scattering measurements. These experimental finding are related to the different chemical composition of plasmas with different CH_4/Ar ratios.
机译:报告了系统研究氢化非晶碳(a-C:H)薄膜的弹性和结构性质与沉积条件的关系的结果。采用了多种技术,将布里渊光散射(BLS),拉曼光谱和X射线反射率(XRR)相结合。膜的质量密度已经通过XRR确定,而BLS已经被用来测试膜的弹性。随着进料气中甲烷含量的增加,沉积的膜既显示出较高的表面瑞利波相速度,又显示出更高的密度,因此表明合成了较硬的材料。如拉曼散射测量所表明的,这种硬化作用归因于在sp〜2晶格中出现更高程度的结构有序。这些实验结果与具有不同CH_4 / Ar比的等离子体的不同化学组成有关。

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