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A study of hard diamond-like carbon films in mid-frequency dual-magnetron sputtering

机译:中频双磁控溅射中类硬质碳膜的研究

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A series of hydrogen-free diamond-like carbon (DLC) films were deposited by a mid-frequency dual-magnetron sputtering under basic conditions of Cr and C target power density between 6 and 18 W/cm~2, bias voltage in a range of - 100 V to - 200 V, and a pure argon atmosphere. Microstructure, microhardness, adhesion, friction and wear properties were investigated for the DLC films to be used as protective films on cutting tools and forming dies, etc. The DLC films exhibited some combined superior properties: high hardness of 30-46 GPa, good adhesion of critical load of 50-65 N, and friction coefficient about 0.1 in air condition. Properties of the magnetron-sputtered carbon films showed a strong dependence on flux and energy of ion bombardment during growth of the films.
机译:通过中频双磁控溅射在Cr和C目标功率密度在6和18 W / cm〜2之间,偏置电压在一定范围内的基本条件下沉积了一系列无氢类金刚石碳(DLC)膜-100 V至-200 V,纯氩气气氛。研究了用作切割工具和成型模具等保护膜的DLC膜的微观结构,显微硬度,附着力,摩擦和磨损性能。DLC膜具有一些综合的优越性能:30-46 GPa的高硬度,良好的附着力在空气条件下的临界载荷为50-65 N,摩擦系数约为0.1。磁控溅射碳膜的性能显示出在膜生长过程中对离子轰击的通量和能量的强烈依赖性。

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