Optical and electrical properties of a-C:H depsited by magnetic confinement of r.f.PECVD plasma

Tomozeiu N.

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Optical and electrical properties of a-C:H depsited by magnetic confinement of r.f.PECVD plasma

机译：射频PECVD等离子体的磁性限制使a-C：H的光电性能

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来源
《Diamond and Related Materials》 |1999年第2amara期|共5页
作者
Tomozeiu N.;
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原文格式 PDF
正文语种 eng
中图分类电热工业、高温制品工业;第Ⅳ族非金属元素及其无机化合物;人造宝石、合成宝石的生产;
关键词
Amorphous carbon; Field emission; Magnetic confinement; Material properties;

机译：非晶碳;场发射;磁约束;材料性能;

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1. a-C:F:H films prepared by PECVD [J] . 刘雄飞, 肖剑荣, 简献忠, 中国有色金属学报（英文版） . 2004,第003期
2. Optical and electrical properties of a-C:H depsited by magnetic confinement of r.f.PECVD plasma [J] . Tomozeiu N. Diamond and Related Materials . 1999,第2aMara期

机译：射频PECVD等离子体的磁性限制使a-C：H的光电性能
3. Electrical and Optical Properties of Si-Incorporated a-C:H Films via the Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Method [J] . Kim In Jun, Choi Won Seok, Hong Byungyou Journal of nanoscience and nanotechnology . 2016,第5期

机译：射频等离子体增强化学气相沉积法制备掺Si的a-C：H薄膜的电学和光学性质
4. Mechanical, electrical and optical properties o a-C: H: N films deposited by plasma CVD technique [J] . K. Chakrabarti, M. Basu, S. Chaudhuri, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 1999,第3a4期

机译：通过等离子CVD技术沉积的a-C：H：N薄膜的机械，电和光学性质
5. Structural, thermal and electrical properties of plasma deposited a-C:F films [C] . Zhenyu Wu, Yintang Yang, Jiayou Wang . 2005

机译：等离子沉积a-C：F膜的结构，热和电性能
6. OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION. [D] . SCHEIDEGGER, GARY LOUIS. 1983

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7. Bi0.9Ho0.1FeO3/TiO2 Composite Thin Films: Synthesis and Study of Optical Electrical and Magnetic Properties [O] . Md. Rafiqul Islam, M. A. Zubair, M. S. Bashar, -1

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Optical and electrical properties of a-C:H depsited by magnetic confinement of r.f.PECVD plasma

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