Fabrication of vertically aligned carbon nanostructures by microwave plasma-enhanced chemical vapor deposition

摘要

Carbon nano-rope films were fabricated on the Ni-catalysed Si substrate by microwave plasma-enhanced chemical vapor deposition employing a mixture of acetylene and hydrogen. These nano-ropes were in the form of self-assembled, stranded carbon nano-fibers and were aligned perpendicular to the substrate. The field emission characteristics for the nano-rope films were observed.