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A near edge X-ray absorption fine structure study of oxidized single crystal and polycrystalline diamond surfaces

机译:氧化单晶和多晶金刚石表面的近边缘X射线吸收精细结构研究

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摘要

The influence of oxidizing environments on single crystal diamond and polycrystalline chemical vapor deposited CVD diamond films was studied using the near edge X-ray absorption fine structure (NEXAFS) pre-edge region in both bulk and surface sensitive modes. The NEXAFS of (100) oriented single crystal diamond was measured following (i) exposure to a microwave (MW) hydrogen plasma, (ii) annealing to 1000 °C, (iii) exposure of the as annealed surface to H_2O, and (iv) exposure of the as annealed surface to O_2. From these measurements particular surface bonding configurations have been assigned to features in the pre-edge structure. The NEXAFS of microcrystalline CVD diamond films was studied following different oxidative treatments using (i) a thermal atomic oxygen (AO) environment, (ii) a hyperthermal (5 eV) AO source, and (iii) an RF oxygen plasma exposure. The nature of the surface layer was found to be different for differently oxidized surfaces. These treatments were carried out as part of a study of CVD diamond durability in the low Earth orbit space environment.
机译:氧化环境的影响对单晶金刚石和多晶化学气相沉积CVD金刚石膜的影响使用近边缘X射线吸收精细结构(NEXAFS)前边缘区域在体和表面敏感模式下进行了研究。在(i)暴露于微波(MW)氢等离子体,(ii)退火至1000°C,(iii)退火后的表面暴露于H_2O和(iv)后测量(100)取向单晶金刚石的NEXAFS )将退火后的表面暴露于O_2。通过这些测量,已将特定的表面粘合配置分配给了前边缘结构中的特征。使用(i)热原子氧(AO)环境,(ii)高温(5 eV)AO源和(iii)RF氧等离子体暴露,在进行不同的氧化处理后,研究了微晶CVD金刚石薄膜的NEXAFS。发现表面层的性质对于不同氧化的表面是不同的。这些处理是在低地球轨道空间环境中进行CVD金刚石耐久性研究的一部分。

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