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Phase separation in magnetron sputtered superhard BCN thin films

机译:磁控溅射超硬BCN薄膜的相分离

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The similar crystalline structure of diamond and cubic boron nitride suggests the synthesis ofsuperhard thin films containing boron, carbon and nitrogen. BCN thin films have been prepared byreactive r.f.-magnetron sputtering of a hexagonal boron nitride target in an argon/acetyleneatmosphere of a constant pressure of 2×10{sup}-2 mbar. A deposition temperature of 600 ℃leads to nearly hydrogen-free BCN films. At a flow ratio of 0.05% C{sub}2H{sub}2/Ar, thecomposition of the deposited BCN films is close to B{sub}5CN{sub}3 as a result of energy dispersiveX-ray (EDX) and elastic recoil detection (ERD) measurements. By applying a r.f.-substrate bias, theion energy has been varied at a constant ratio of ions to film-forming particles of 4. The BCN filmsshow a maximum in stress at an ion energy of 110 eV due to knock-on subplantation of argon ions anda phase separation into carbon, boron and cubic boron nitride regions as a result of X-ray diffractioninvestigations, Auger electron- and infra-red spectroscopy.
机译:金刚石和立方氮化硼的相似晶体结构表明,含有硼,碳和氮的超硬薄膜的合成。 BCN薄膜是通过在氩气/乙炔气氛中以恒定压力2×10 {sup} -2 mbar进行六方氮化硼靶的反应磁控溅射制备的。 600℃的沉积温度可形成几乎无氢的BCN膜。在0.05%C {sub} 2H {sub} 2 / Ar的流量比下,由于能量色散X射线(EDX)和弹性,沉积的BCN膜的组成接近B {sub} 5CN {sub} 3后坐力检测(ERD)测量。通过施加rf衬底偏压,离子能量以恒定的离子与成膜颗粒4的比率变化。BCN膜在110 eV的离子能量下由于氩离子的敲除植入而显示出最大应力。通过X射线衍射研究,俄歇电子和红外光谱学将其相分离为碳,硼和立方氮化硼区域。

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