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Multilayer Fresnel zone plate for high-energy X-ray by DC sputtering deposition

机译:直流溅射沉积多层高能X射线菲涅耳波带片

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摘要

A hard X-ray microbeam is a key technology for third-generation high-brilliance synchrotron radiation sources such as SPring-8. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. A multilayer (sputtered-sliced) FZP is suitable for use in hard X-ray region, because large thickness can be available. Zone (multilayer interface) roughness is inevitable to the multilayer FZP, which results in the inferior-focusing characteristic. Some Cu/Al concentric multilayers were fabricated by DC sputtering deposition. In order to reduce the oblique incidence of sputtered atoms on the wire substrate, a cylindrical slit was placed between the target and the wire substrate. As a result, the interface roughness was improved with very good repeatability. (C) 2002 Elsevier Science Ltd. All rights reserved. [References: 18]
机译:硬X射线微束是SPring-8等第三代高亮度同步加速器辐射源的关键技术。菲涅耳波带片(FZP)是有希望的X射线聚焦元件之一。多层(溅射切片)FZP适合用于硬X射线区域,因为可以提供较大的厚度。多层FZP不可避免地具有区域(多层界面)粗糙度,这导致聚焦特性较差。通过DC溅射沉积制备了一些Cu / Al同心多层。为了减少溅射原子在金属丝基板上的倾斜入射,在靶材和金属丝基板之间设置了圆柱形的缝隙。结果,以非常好的重复性改善了界面粗糙度。 (C)2002 Elsevier ScienceLtd。保留所有权利。 [参考:18]

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