Formation and physical properties of Al base alloys by sputtering

摘要

Ti-Al and Ti-Si alloys were prepared by RF sputtering in a low-pressure argon atmosphere. The microhardness and thermal stability of these alloys were investigated in relation to the structure of alloys. In Al-Ti system, an amorphous phase and AlTi{sub}3 were formed in the composition range of 35-60 at%Ti and 60-80.5 at%Ti, respectively. In Al-Si system, an amorphous phase was formed for Si content of 45 at% or more. Although the microhardeness of Al-Ti alloys shows a maximum at 50 at%Ti, its value for Al-Si alloys rises with increasing Si content. These results suggest that the atomic bonding character is different in both alloys, and the covalent character becomes stronger for Si rich Al-Si alloys.