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Effect of substrate on the dielectric properties of bismuth magnesium niobate thin films prepared by RF magnetron sputtering

机译:衬底对射频磁控溅射制备铌酸铋镁薄膜介电性能的影响

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摘要

The Bi+(1.5)MgNb_(1.5)O_7 (BMN) thin films were deposited on ITO/glass, FTO/glass and Pt/Si (100) substrate by rf magnetron sputtering. The dielectric properties of BMN thin films on different substrates were investigated. All the BMN thin films showed cubic pyrochlore structure with (222) preferred orientation. The BMN thin film deposited on ITO glass exhibited dielectric constant of 109, low dielectric loss of0.0013 at 1 MHz, and maximum tunability of 34% at the bias field of 1.2 MV/cm, which is better than that prepared on FTO/glass and Si substrate. The leakage current of BMN thin film on different substrates was also studied and a possible explanation was proposed. These results suggest that the ITO/glass is a promising option substrate for better properties of BMN thin film.
机译:通过射频磁控溅射在ITO /玻璃,FTO /玻璃和Pt / Si(100)衬底上沉积Bi +(1.5)MgNb_(1.5)O_7(BMN)薄膜。研究了BMN薄膜在不同基底上的介电性能。所有BMN薄膜均显示立方烧绿石结构,具有(222)择优取向。沉积在ITO玻璃上的BMN薄膜表现出109的介电常数,在1 MHz下的低介电损耗0.0013和在1.2 MV / cm的偏置场上的最大可调谐性为34%,这比在FTO /玻璃上制备的更好和硅衬底。还研究了BMN薄膜在不同基板上的泄漏电流,并提出了可能的解释。这些结果表明,ITO /玻璃是具有良好BMN薄膜性能的有前途的选择衬底。

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