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首页> 外文期刊>High Temperature Material Processes >PLASMA GENERATION IN A LOW-PRESSURE HOLLOW-CATHODE NON-SELF-SUSTAINED GLOW DISCHARGE
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PLASMA GENERATION IN A LOW-PRESSURE HOLLOW-CATHODE NON-SELF-SUSTAINED GLOW DISCHARGE

机译:低压空心阴极非自持辉光放电中的等离子体生成

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Research on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N_2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 10~(11) cm~(-3) at 15-A currents. Nitriding in the discharge plasma at 600℃ for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 μm.
机译:对空心阴极非自持辉光放电的研究表明,在0.1 Pa的压力下进行放电操作是可行的。根据实验条件,放电操作电压可以达到〜50 V,这远低于自放电的。在同一电极系统中持续辉光放电。放电电流范围可达30A。工作气体为Ar,N_2和N基混合气体。放电等离子体的探针测量表明,电子温度在1.5至7 eV之间变化,取决于气体的压力及其种类,在15A电流下等离子体密度可以达到10〜(11)cm〜(-3)。 。在放电等离子体中于600℃下进行2 h的渗氮可使Ti(VT1-0)的硬度增加3.5倍,使12Cr18Ni10Ti的硬度增加3倍,而改变的层深为35μm。

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