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Room-temperature deposition of yttria-stabilized zirconia buffer layer on metallic substrates by laser ablation

机译:通过激光烧蚀在金属基底上室温沉积氧化钇稳定的氧化锆缓冲层

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摘要

THE preparation of high-temperature superconducting (HTSC) wires or tapes is very important for the power application of HTSC. High-J_c properties of Y-Ba-Cu-O thin film at liq-uid-nitrogen temperature are very attractive not only for small-sized electronic devices, but also for large-scale applications such as high-power transmission cables, high-field magnets and large-scale microwave components. Large-current power application would be achieved if high-J_c YBCO films were grown on practical cheapand flexible metallic substrates. An yttria-stabi-lized zirconia (YSZ) buffer layer between the YBCO and metallic substrates was used to prevent the diffusion of the elements from metal to YBCO films. But without epitaxial relationships, there are a large number of large-angle grain boundaries in YBCO film, which limited the J_c ranging from 10~3 to 10~4 A/cm~2. Recently, new methods to solve this problem were reported , i.e. ion beam-assisted deposition (IBAD), was used to align in-plane a and b axes of YSZ deposited on polycrystalline substrates. Biaxially aligned YSZ films were obtained with concurrent off-normal ion-beam bombardment. The YSZ layers effectively controlled the in-plane texture of YBCO films on it. The J_c values were markedly improved to over 10~6 A/cm~2 (-77 K, 0 T).
机译:高温超导(HTSC)电线或胶带的制备对于HTSC的电源应用非常重要。 Y-Ba-Cu-O薄膜在液氮温度下的高J_c特性不仅对于小型电子设备非常有吸引力,而且对于大功率传输电缆,磁场磁铁和大型微波组件。如果将高J_c YBCO薄膜生长在实用的廉价柔性金属基板上,将可实现大电流电源应用。 YBCO和金属基板之间的氧化钇稳定的氧化锆(YSZ)缓冲层用于防止元素从金属扩散到YBCO膜中。但由于没有外延关系,在YBCO薄膜中存在大量的大角度晶界,将J_c限制在10〜3〜10〜4 A / cm〜2范围内。最近,报道了解决该问题的新方法,即离子束辅助沉积(IBAD)被用于对准沉积在多晶衬底上的YSZ的面内a轴和b轴。获得双轴取向的YSZ膜,同时进行非常规离子束轰击。 YSZ层可有效控制其上的YBCO膜的面内纹理。 J_c值显着提高到10〜6 A / cm〜2(-77 K,0 T)以上。

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