Dielectric properties of multilayered Ba0.5Sr0.5TiO3 thin films deposited on ITO-coated corning 1737 glass by rf magnetron sputtering

摘要

A new stacking method via variation of substrate temperature in rf magnetron sputter is used to fabricate polycrystalline/polycrystalline Ba0.5Sr0.5TiO3 thin films with higher dielectric constant, higher breakdown strength and lower leakage current densities than those prepared by a conventional deposition method. The improved figure of merit G (epsilon(0)epsilon(r)Eb) of the Ba0.5Sr0.5TiO3 thin films implies that they are a feasible insulation layer for thin film electroluminescent devices.