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首页> 外文期刊>Transactions of the Magnetics Society of Japan >Deposition of Multilayers Using Fast Switching Triple Ring Magnetron Cathode
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Deposition of Multilayers Using Fast Switching Triple Ring Magnetron Cathode

机译:快速开关三环磁控阴极沉积多层膜

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Magnetic Co/Pd superlattices have been sputter deposited using special triple concentric ring magnetron cathode. Magnetic layer properties are investigated as function of argon/krypton sputter gas pressure and of Co layer thickness showing maximum coercivity at 0.2 nm Co thickness. Coercivity is approximately linear function of sputter pressure with highest value of 7 kOe at 40 mu bar Kr. Special software to control sputter time and power allow deposition times of less than 0.1 s for an individual layer of the superlattice. Power ratio dependent co-sputtering of two cathodes enables preparation of stoichiometrically varying TbFeCo layers giving therefore a tool for efficient investigations of magnetic properties on layer composition.
机译:磁性Co / Pd超晶格已使用特殊的三重同心环磁控管阴极进行溅射沉积。研究了磁性层特性与氩气/ k溅射气压和Co层厚度的函数关系,该Co层厚度在0.2 nm Co厚度下显示出最大矫顽力。矫顽力大约是溅射压力的线性函数,在40μbar Kr时最高值为7 kOe。用于控制溅射时间和功率的专用软件允许超晶格的单个层的沉积时间少于0.1 s。取决于功率比的两个阴极的共溅射能够制备化学计量变化的TbFeCo层,因此为有效研究层组成上的磁性提供了一种工具。

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