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Preparation and characterisation of nanostructured tin oxide (SnO_2) films by sol-gel spin coating technique

机译:溶胶-凝胶旋涂技术制备纳米结构的氧化锡(SnO_2)薄膜及其表征

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摘要

Highly transparent tin oxide thin films (SnO2) have been prepared using the sol-gel spin coating technique, optimising process parameters such as the solute concentration, spin rate and time of the turn table, film thickness (number of coatings) and heat treatment temperature. The X-ray diffraction (XRD) studies point to the polycrystalline structure of the developed films. The films deposited under optimum conditions are highly transparent in the visible region with a transmittance of 94 percent at 550 nm and have a resistivity of 3 X 10~(-3) OMEGA cm. The films have been obtained at a relatively low process temperature of 400 deg C.
机译:使用溶胶-凝胶旋涂技术制备了高度透明的氧化锡薄膜(SnO2),优化了工艺参数,例如溶质浓度,旋转台的旋转速率和时间,膜厚(涂层数)和热处理温度。 X射线衍射(XRD)研究指出了已显影薄膜的多晶结构。在最佳条件下沉积的薄膜在可见光区域具有很高的透明度,在550 nm处的透射率为94%,电阻率为3 X 10〜(-3)OMEGA cm。膜是在相对较低的400摄氏度的加工温度下获得的。

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