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Experimental study of plasma nitriding dental implant surfaces

机译:等离子渗氮牙科种植体表面的实验研究

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Titanium samples have been used as the substrate that was submitted to a plasma discharge nitriding for the surface treatment of dental implants. Two different arrangements regarding the electrode shapes were tested: planar and hollow cathode. The treated samples were evaluated regarding surface phases, texture, roughness, layer thickness, wettability and visual appearance. The roughness of the surface of all samples submitted to the plasma nitriding process was lower compared to those treated by commercially available technology plasma spray, on the other hand, better wettability was achieved. Some commercially available implants were also treated under the best conditions found with the experiment at titanium samples. After plasma nitriding these implants, tests were carried out to evaluate both wettability and surface texture. As a result the treated implants had both their surface texture and wettability improved.
机译:钛样品已经用作基材,该基材经过等离子放电氮化处理,用于牙科植入物的表面处理。测试了关于电极形状的两种不同布置:平面和空心阴极。评价处理过的样品的表面相,织构,粗糙度,层厚度,润湿性和视觉外观。与通过商业化技术进行等离子喷涂处理的样品相比,所有经过等离子渗氮处理的样品表面的粗糙度都较低,另一方面,获得了更好的润湿性。还对一些钛合金样品进行了实验发现的最佳条件下的某些市售植入物。等离子氮化这些植入物后,进行测试以评估润湿性和表面质地。结果,处理过的植入物的表面质地和润湿性均得到改善。

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