Influence of biofunctionalization process on properties of silicon oxynitride substrate layer

摘要

The paper presents investigations of the influence of chemically aggressive biofunctionalization process for histidine-tagged proteins on thickness, optical and mechanical properties of silicon oxynitride (SiO_xN_y) film, which is often used as substrate material for a number of biosensors. We discuss the biofunctionalization effect for a set of SiO_xN_y films deposited by the radio frequency plasma-enhanced chemical vapour deposition method with various N_2O/(SiH_4+NH_3) gas flow rate. It has been found that as an effect of biofunctionalization procedure, the SiO_xN_y films increase both their refractive index and hardness. Moreover, films deposited with higher N_2O flow, which are softer and show lower refractive index, may slightly reduce their thickness as a result of the biofunctionalization process, but their surface favours more formation of on them protein biofilm than on films obtained with lower concentration of N_2O.