An in situ approach to robust superhydrophobic carbon-based film

摘要

In this communication, the novel carbon-based films have been obtained by a facile in situ deposition method controlling the deposition time, which exhibit a significant increase in the surface hydrophobicity. The detailed cause of this phenomenon has been well probed. The results reveal that the increase of the surface roughness and microstructure modification resulting from the etching effect of F ions could be in charge of the increase of the hydrophobicity. Copyright (c) 2015 John Wiley & Sons, Ltd.