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Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxide

机译:利用氧化钨的着色表征气相沉积非晶氧化铝膜的氢渗透阻挡性能

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摘要

Low hydrogen diffusivity and solubility of aluminum oxide make a vapor deposited aluminum oxide (Al2O3) film an anticipated hydrogen permeation barrier coating. In this paper, amorphous Al2O3 film was deposited using filtered vacuum arc method. As a substrate, vapor deposited amorphous tungsten oxide (WOE) film was used in order to characterize hydrogen permeation barrier performance of the Al2O3 film utilizing coloration of WOE when it forms HxWO3. The samples were exposed to the flux and angular quantified atomic hydrogen beam, and the degree of coloration was characterized by visibly: to new infrared range transmission spectroscopy. Using this method, a half-micron thick amorphous Al2O3 film reducing atomic hydrogen reaching the underlying WO3 film to 3 X 10(-4) was measured. Furthermore, Al2O3 film as thin as 20 nm showed atomic hydrogen reduction of 4 X 10(-3). The results indicate effectiveness of thin vapor depasited Al2O3 film as a permeation barrier against atomic hydrogen. (C) 2002 Elsevier Science B.V All rights reserved. [References: 12]
机译:氧化铝的低氢扩散率和溶解度使气相沉积的氧化铝(Al2O3)膜成为预期的氢渗透阻隔涂层。本文采用过滤真空电弧法沉积了非晶态的Al2O3薄膜。作为衬底,使用气相沉积的非晶氧化钨(WOE)膜是为了利用WOE形成HxWO3时的着色来表征Al2O3膜的氢渗透阻挡性能。将样品暴露于通量和角度量化的原子氢束中,并通过新的红外测距光谱对可见度进行表征。使用这种方法,测量了一个半微米厚的非晶态Al2O3膜,该膜将到达下面的WO3膜的原子氢还原为3 X 10(-4)。此外,薄至20 nm的Al2O3膜显示出4 X 10(-3)的原子氢还原。结果表明,薄的汽相沉积的Al2O3薄膜可作为对原子氢的渗透屏障。 (C)2002 Elsevier Science B.V保留所有权利。 [参考:12]

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