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Investigation of the mechanical properties of thin films by nanoindentation, considering the effects of thickness and different coating-substrate combinations

机译:考虑纳米厚度和不同涂层-基材组合的影响,通过纳米压痕研究薄膜的机械性能

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In order to further investigate nanoindentation data of film-substrate systems and to learn more about the mechanical properties of nanometer film-substrate systems, two kinds of films on different substrate systems have been tested with a systematic variation in film thickness and substrate characteristics. The two kinds of films are aluminum and tungsten, which have been sputtered on to glass and silicon substrates, respectively. Indentation experiments were performed with a Nano Indent XP II with indenter displacements typically about two times the nominal film thicknesses. The resulting data are analyzed in terms of load-displacement curves and various comparative parameters, such as hardness, Young's modulus, unloading stiffness and elastic recovery. Hardness and Young's modulus are investigated when the substrate effects are considered. The results show how the composite hardness and Young's modulus are different for different substrates, different films and different film thicknesses. An assumption of constant Young's modulus is used for the film-substrate system, in which the film and substrate have similar Young's moduli. Composite hardness obtained by the Joslin and Oliver method is compared with the directly measured hardness obtained by the Oliver and Pharr method. (C) 2004 Elsevier B.V. All rights reserved.
机译:为了进一步研究膜-基底系统的纳米压痕数据并更多地了解纳米膜-基底系统的机械性能,已经对不同基底系统上的两种膜进行了测试,膜厚度和基底特性发生了系统性变化。两种膜是铝和钨,它们分别被溅射到玻璃和硅衬底上。压痕实验是使用Nano Indent XP II进行的,压痕位移通常约为标称膜厚的两倍。根据载荷-位移曲线和各种比较参数(例如硬度,杨氏模量,卸载刚度和弹性回复)分析所得数据。当考虑基材效应时,研究硬度和杨氏模量。结果表明,在不同的基材,不同的薄膜和不同的薄膜厚度下,复合材料的硬度和杨氏模量如何不同。膜-基底系统使用恒定杨氏模量的假设,其中膜和基底具有相似的杨氏模量。将通过Joslin和Oliver方法获得的复合硬度与通过Oliver and Pharr方法获得的直接测量的硬度进行比较。 (C)2004 Elsevier B.V.保留所有权利。

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