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Influence of crack offset distance on interaction of multiple collinear and offset edge cracks in a rectangular plate

机译:裂纹偏移距离对矩形板中多个共线和偏移边缘裂纹相互作用的影响

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摘要

In the present work, photoelastic and finite element method have been employed to study the interaction between two collinear cracks and two offset edge cracks. CY 230 resin and hardener HY 951 are used for preparation of photoelastic material. Mode I and mode II stress intensity factors were determined by using finite element method and compared with the experimental results. A good agreement is found between the numerical and experimental results. Second degree polynomial functions are presented to evaluate the mixed mode stress intensity factors from mode I stress intensity factor and crack offset distance H. The limits of crack offset distance for significant crack interaction have been discussed.
机译:在目前的工作中,采用光弹性和有限元方法研究了两个共线裂纹和两个偏置边缘裂纹之间的相互作用。 CY 230树脂和硬化剂HY 951用于制备光弹性材料。利用有限元方法确定了模式I和模式II的应力强度因子,并与实验结果进行了比较。在数值和实验结果之间找到了很好的一致性。提出了二阶多项式函数,用于从模式I应力强度因子和裂纹偏移距离H评估混合模式应力强度因子。讨论了有效的裂纹相互作用的裂纹偏移距离的限制。

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