首页> 外文期刊>The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical >Minority Carrier Accumulation and Interfacial Kinetics in Nanosized Pt-Dotted Silicon Electrolyte Interfaces Studied by Microwave Techniques
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Minority Carrier Accumulation and Interfacial Kinetics in Nanosized Pt-Dotted Silicon Electrolyte Interfaces Studied by Microwave Techniques

机译:微波技术研究的纳米级Pt点状硅电解质界面中的少数载流子积累和界面动力学

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摘要

Photoinduced microwave conductivity (PMC) measurement allows the determination of the excess densities of accumulating minority carriers in the potential region of the kinetically limited, increasing photocurrent. Compared with PMC signals obtained with slightly oxidized naked silicon interfaces, those for the Pt-dotted silicon interfaces have a bell shaped narrow distribution and are negatively shifted with respect to the photocurrent-potential curve. It is shown that minority carrier accumulation is essentially controlled by the peculiar Si/Pt particle interfacial barrier which can be easily overcome by holes at increasingly positive potential to take advantage of the Pt-mediated reactivity. The potential and light dependent transfer rate of minority carriers at the interface strongly increases with the applied potential. Electrochemical corrosion essentially leads to a gradual modification of this barrier through formation of a Si-SiO_x-Pt structure. The influence of Fe~(2+)/Fe~(3+) concentration on the minority carrier accumulation profile as well as the photon flux dependence of the PMC signals can be explained as being due to a transport limitation phenomenon in the solution near the Pt particles.
机译:光致微波电导率(PMC)测量允许确定在动力学受限制的潜在电流区域中积累的少数载流子的过量密度,从而增加光电流。与用轻微氧化的裸硅界面获得的PMC信号相比,点Pt硅界面的信号呈钟形窄分布,并且相对于光电流-电势曲线呈负向偏移。结果表明,少数载流子的积累基本上是由特殊的Si / Pt颗粒界面势垒控制的,利用正电势越来越大的空穴可以很容易地克服空穴,从而利用Pt介导的反应性。界面处少数载流子的电势和光依赖的传输速率随施加的电势而大大增加。电化学腐蚀本质上通过形成Si-SiO_x-Pt结构导致该势垒的逐渐改变。 Fe〜(2 +)/ Fe〜(3+)浓度对少数载流子累积分布以及PMC信号的光子通量依赖性的影响可以解释为是由于溶液附近的输运限制现象引起的。铂粒子。

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