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Magnetic properties of dc magnetron sputtered and evaporated amorphous films

机译:直流磁控溅射和蒸发非晶膜的磁性

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摘要

Compositions of Fe_(81)B_(13.5)Si_(3.5)C_2, Fe_(67)Co_(18)Si_1B_(14) and Fe_(5.85)Co_(72.15)Mo_2B_(15)Si_5 were deposited on to rigid and flexible substrates for the first time using a dc sputtering source as part of a novel Rotating Cryostat (RC). The films sputtered on silicon and glass show only isotropic magnetisation, whereas those sputtered on a polyimide (Kapton~(TM)) substrate exhibited either isotropic or anisotropic magnetisation depending upon composition. Similar findings were obtained for equivalent evaporated films.
机译:将Fe_(81)B_(13.5)Si_(3.5)C_2,Fe_(67)Co_(18)Si_1B_(14)和Fe_(5.85)Co_(72.15)Mo_2B_(15)Si_5的成分沉积到刚性和柔性衬底上首次使用直流溅射源作为新型旋转低温恒温器(RC)的一部分。溅射在硅和玻璃上的薄膜仅表现出各向同性的磁化强度,而溅射在聚酰亚胺(KaptonTM)基板上的薄膜则表现出各向同性或各向异性的磁化强度。对于等效的蒸发膜也获得了类似的发现。

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