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首页> 外文期刊>The European physical journal. Applied physics >Etching, micro hardness and laser damage threshold studies of a nonlinear optical material L-valine
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Etching, micro hardness and laser damage threshold studies of a nonlinear optical material L-valine

机译:非线性光学材料L-缬氨酸的蚀刻,显微硬度和激光损伤阈值研究

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摘要

A nonlinear optical crystal of L-valine was grown from an aqueous solution containing a small amount of phosphoric acid by the slow evaporation method. The grown crystal was characterized by a single crystal X-ray diffraction to determine the unit cell parameters. The powder X-ray diffraction analysis also confirmed the lattice parameters to be a = 9.6687(7) b = 5.2709(4) c = 12.0371(10) nd β = 90.805(4)°. The results of the Inductively Coupled Plasma Optical Emission Spectrometry (ICPOES) indicate the presence of a small amount of phosphorus in the grown crystal. The Vickers micro hardness test was performed to study the mechanical strength of the crystals. Chemical etching studies were carried out to analyze the dislocation structure. The laser damaged threshold of the grown crystal was measured to be 11.11 GW/cm ~2 for 10 ns pulse at 1064 nm, which is higher than that of the standard nonlinear optical crystals like KDP. Second harmonic generation of the grown crystals was also 1.44 times that of KDP.
机译:通过缓慢蒸发法,从含有少量磷酸的水溶液中生长出L-缬氨酸的非线性光学晶体。通过单晶X射线衍射表征生长的晶体以确定晶胞参数。粉末X射线衍射分析还证实晶格参数为a = 9.6687(7)b = 5.2709(4)c = 12.0371(10)ndβ= 90.805(4)°。电感耦合等离子体发射光谱法(ICPOES)的结果表明,在生长的晶体中存在少量磷。进行维氏显微硬度测试以研究晶体的机械强度。进行化学蚀刻研究以分析位错结构。在1064 nm的10 ns脉冲下,生长晶体的激光损伤阈值测量为11.11 GW / cm〜2,这比诸如KDP的标准非线性光学晶体的激光损伤阈值高。生长晶体的二次谐波产生也是KDP的1.44倍。

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