Ultraviolet self-generating relief micro-optical elements through crosslinking photopolymerization of liquid resins

摘要

The use of a self-processing dry photopolymer layer capable of memorizing optical information as a local change in thickness, is proposed for the fabrication of microlenses, binary holograms and gratings. Relief micro-optical elements are generated by direct imagewise exposure through a mask. A gradient of chemical composition and a gradient of surface free energy cause the transfer of reactive species between dark and illuminated areas. Contrary to conventional lithographic techniques that require wet chemical post-treatment to remove parts of the photoresist material, the fully self-processing character of this technique makes the record available in situ and immediately after exposure.