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首页> 外文期刊>The European physical journal. Applied physics >On physical properties of undoped and Al and In doped zinc oxide films deposited on PET substrates by reactive pulsed laser deposition
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On physical properties of undoped and Al and In doped zinc oxide films deposited on PET substrates by reactive pulsed laser deposition

机译:反应性脉冲激光沉积在PET基底上的未掺杂和Al和In掺杂的氧化锌膜的物理性质

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Undoped and Al and In doped ZnO films were deposited on flexible PET substrates by Reactive Pulsed Laser Deposition (R-PLD). The morphological and structural characteristics of the obtained structures were investigated by AFM, SEM and XRD respectively. The transmittance spectra were recorded in the 300–1200 nm wavelength range and the electrical conductivity was measured. The samples appeared as granular and polycrystalline with high transparency and had a good electrical conductivity. The crystallinity of the undoped ZnO films improved with increasing pressure of the reactive oxygen gas. Doping of ZnO with Al or In modified the energy band gap and the resistivity of the material. The possibility for the application of such structures for the development of hybrid photovoltaic cells on flexible substrates will be demonstrated.
机译:通过反应脉冲激光沉积(R-PLD)将未掺杂的Al和In掺杂的ZnO薄膜沉积在柔性PET基板上。分别通过原子力显微镜,扫描电镜和X射线衍射对所得结构的形貌和结构特征进行了研究。在300–1200 nm波长范围内记录透射光谱,并测量电导率。样品显示为具有高透明度的颗粒状和多晶并且具有良好的导电性。随着活性氧气压力的增加,未掺杂的ZnO薄膜的结晶度得到改善。用Al或In掺杂ZnO可以改变材料的能带隙和电阻率。将证明将这种结构用于在柔性基板上开发混合光伏电池的可能性。

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