首页> 外文期刊>Chemistry: A European journal >Surface Organometallic Chemistry of Main Group Elements: Selective Synthesis of Silica Supported [#ident toSi-OB (C_6F_5)_3]~-[HNEt_2Ph]~+
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Surface Organometallic Chemistry of Main Group Elements: Selective Synthesis of Silica Supported [#ident toSi-OB (C_6F_5)_3]~-[HNEt_2Ph]~+

机译:主要族元素的表面有机金属化学:二氧化硅负载的[Si-OB(C_6F_5)_3]〜-[HNEt_2Ph]〜+的选择性合成

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摘要

The reaction of the Lewis acid B(C_6F_5)_3 with silanol groups of silica surfaces, dehydroxylated at different temperatures (300, 500, 700, and 800deg C), has been investigated in presence of the BrOnsted based NEt_2Ph. The structure of the resulting modified silica supports [#ident toSI-OB(C_6F_5)_3~-[NHEt_2Ph]~+ (1) has been carefully identified by IR and multinuclear solid-state NMR spectroscopies, isotopic ~2H and ~(18)C labeling, elemental analysis, molecular modeling, and comparison with synthesized molecular models. Highly dehydroxylated silcia surfaces were required to transform selectively each silanol group into unique [ident toSi-OB(C_6F_5)_3]~-[HNEt_2Ph]~+ fragments. For lower dehydroxylation temperatures, two sorts of surface sites were coexisting on silica; the free silanol groups [ident toSiOH] and ionic species 1.
机译:在基于布朗斯台德的NEt_2Ph的存在下,研究了路易斯酸B(C_6F_5)_3与二氧化硅表面的硅烷醇基在不同温度(300、500、700和800摄氏度)下脱羟基的反应。所得改性二氧化硅载体[SI-OB(C_6F_5)_3〜-[NHEt_2Ph]〜+的结构已通过IR和多核固态NMR光谱,同位素〜2H和〜(18)进行了仔细鉴定。 C标记,元素分析,分子建模以及与合成分子模型的比较。需要高度脱羟基的二氧化硅表面以选择性地将每个硅烷醇基团转变成独特的[与Si-OB(C_6F_5)_3相同]-[HNEt_2Ph]〜+片段。对于较低的脱羟基温度,在二氧化硅上共存两种表面位点。游离硅烷醇基[与SiOH相同]和离子种类1。

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