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首页> 外文期刊>Protection of Metals >The Kinetics and Mechanism of Thermal Oxidation of Electrolessly Deposited Ni-B and Ni-W-B Alloys
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The Kinetics and Mechanism of Thermal Oxidation of Electrolessly Deposited Ni-B and Ni-W-B Alloys

机译:化学沉积Ni-B和Ni-W-B合金的热氧化动力学及机理

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摘要

The kinetics and mechanism of thermal oxidation of electrolessly reduced Ni-B and Ni-W-B alloys are studied by precision thermogravimetry and x-ray photoelectron spectroscopy. It is shown that the oxidation is mainly determined by properties of boron oxides. At temperatures over 300 deg C, the oxidation is accompanied by a sublimation of boron oxides formed. Traces of water and hydrogen in freshly deposited alloys affect significantly both the kinetics of the alloys oxidation and sublimation of the oxides. The vitreous oxide film well adsorbs water vapor and can be readily removed from the sample surface.
机译:通过精密热重分析和X射线光电子能谱研究了化学还原的Ni-B和Ni-W-B合金的热氧化动力学和机理。结果表明,氧化主要取决于氧化硼的性质。在超过300℃的温度下,氧化伴随着所形成的氧化硼的升华。新鲜沉积合金中的痕量水和氢会显着影响合金氧化和氧化升华的动力学。氧化玻璃膜很好地吸收了水蒸气,可以很容易地从样品表面除去。

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