Ordering in thin films of block copolymers: Fundamentals to potential applications

摘要

The ordering of block copolymers in thin films is reviewed, starting from the fundamental principles and extending to recent promising developments as templates for nanolithog-raphy which may find important applications in the semiconductor industry. Ordering in supported thin films of symmetric and asymmetric AB diblock and ABA triblock copolymers is discussed, along with that of more complex materials such as ABC triblocks and liquid crystalline block copolymers. Techniques to prepare thin films, and to characterise ordering within them, are summarized. Several methods to align block copolymer nanos-tructures, important in several applications are outlined. A number of potential applications in nanolithography, production of porous materials, templating, and patterning of organic and inorganic materials are then presented. The influence of crystallization on the morphology of a block copolymer film is briefly discussed, as are structures in grafted block copolymer films.