RADIATION CURING

摘要

Curing kinetics and thermal properties are reported for a system based on trithiol and triallyl ether. Parameters were investigated versus increasing content of POSS (polyoligomeric silsesquioxane) for a better understanding of the effect of low loading of POSS on the final properties. Vinyl and carboxylate POSS have been synthesised and employed for a better compatibility with the allyl ether and thiol. It is reported that the Tg is not modified by increased content of POSS, but scratch and flame retardancy increase with increased POSS content. The photopolymerisation rates are unchanged for a content of POSS up to 5%. Thermal stability is also reported as increased.