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Low Friction-Coefficient TiBCN Nanocomposite Coatings Prepared by Cathode Arc Plasma Deposition

机译:阴极电弧等离子体沉积制备低摩擦系数TiBCN纳米复合涂层

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TiBCN nanocomposite coatings were deposited on cemented carbide and Si (100) by a cathode arc plasma system, in which TiB2 cathodes were used in mixture gases of N-2 and C2H2. X-ray diffraction shows that TiB2 and Ti2B5 peaks enhance at low flow rates of C2H2, but they shrink when the flow rate is over 200 sccm. An increase of deposition rate was obtained from different TiBCN thicknesses for the same deposition time measured by scanning electron microscopy. Atomic force microscopy shows that the surface roughnesses are similar to 40 nm and similar to 20 nm at C2H2 flow rates of 0-100 sccm and of 150-300 sccm, respectively. High resolution transmission electron microscopy and X-ray photoelectron spectroscopy show that the coatings consist of nanocrystal phases Ti2B5, TiB2 and TiN, and amorphous phase carbon and BN. The average crystal sizes embedded in the amorphous matrices are 200 nm and 10 nm at C2H2 flow rates of 200 sccm and 300 sccm, respectively. In Raman spectra, the D- and G-bands increase with C2H2 flows at low flow rates, but weaken at high flow rates. The microhardness of the coatings decreases from 28.6 GPa to 20 GPa as the C2H2 increases from 0 sccm to 300 sccm, and the ball-on-disk measurement shows a dramatic decrease of the friction coefficient from 0.84 to 0.13. The reason for the reduced hardness and friction coefficient with the change of C2H2 flow rates is discussed.
机译:TiBCN纳米复合涂层通过阴极电弧等离子体系统沉积在硬质合金和Si(100)上,其中TiB2阴极用于N-2和C2H2的混合气体。 X射线衍射显示,在低流速的C2H2下,TiB2和Ti2B5峰增强,但当流速超过200 sccm时,它们会收缩。对于通过扫描电子显微镜测量的相同沉积时间,从不同的TiBCN厚度获得了沉积速率的增加。原子力显微镜显示,在C2H2流量为0-100 sccm和150-300 sccm时,表面粗糙度分别类似于40 nm和20 nm。高分辨率透射电子显微镜和X射线光电子能谱显示,涂层由纳米晶相Ti2B5,TiB2和TiN以及非晶相碳和BN组成。在200 sccm和300 sccm的C2H2流速下,嵌入到非晶基质中的平均晶体尺寸分别为200 nm和10 nm。在拉曼光谱中,D波段和G波段在低流速下随C2H2流量增加而增加,而在高流速下减弱。当C2H2从0 sccm增加到300 sccm时,涂层的显微硬度从28.6 GPa降低到20 GPa,圆盘球测量显示摩擦系数从0.84急剧降低到0.13。讨论了随着C2H2流量的变化硬度和摩擦系数降低的原因。

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