首页> 外文期刊>Physics of the solid state >Generation of Shallow Nitrogen–Oxygen Donors as a Method for Studying Nitrogen Diffusion in Silicon
【24h】

Generation of Shallow Nitrogen–Oxygen Donors as a Method for Studying Nitrogen Diffusion in Silicon

机译:浅氮供氧体的生成作为研究硅中氮扩散的方法

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

The nitrogen concentration distribution C(z) obtained after diffusion of nitrogen from the bulk of a sample toward the surface is determined with a high accuracy through subsequent heat treatment at moderate temperatures (for example, at 650°C). This process leads to the formation of shallow thermal donors (nitrogen–oxygen complexes) with a concentration distribution over the depth z of the sample that corresponds to the nitrogen concentration profile C(z) and, therefore, makes it possible to calculate this profile. The proposed method is used to determine the nitrogen concentration profiles C(z) after homogenizing annealing at 950, 1000, and 1050°C. At high oxygen concentrations, the nitrogen transport is promoted by high-rate dissociation of nitrogen dimers. On the other hand, the nitrogen transport is slightly hindered by partial oxidation of nitrogen monomers. The results obtained indicate that the latter effect is not very strong, because the dimeric nitrogen species predominate over the monomeric nitrogen species in the sample and the diffusion profile is determined by the product D_1K~(1/2), where D_1 is the diffusion coefficient of nitrogen monomers and K is the dissociation constant.
机译:通过随后在中等温度(例如650℃)下的热处理,以高精度确定了氮从样品的大部分向表面扩散之后获得的氮浓度分布C(z)。该过程导致形成浅热供体(氮-氧配合物),其浓度分布在样品的深度z上,与氮浓度分布C(z)相对应,因此可以计算该分布。所提出的方法用于确定在950、1000和1050℃下均质退火后的氮浓度分布C(z)。在高氧浓度下,氮二聚体的高解离速率促进了氮的转运。另一方面,氮单体的部分氧化会稍微阻碍氮的输送。所得结果表明,后者的作用不是很强,因为二聚体氮物质比样品中的单体氮物质占优势,并且扩散曲线由乘积D_1K〜(1/2)决定,其中D_1是扩散系数氮单体的摩尔数,K为解离常数。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号