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PERSISTENT QUANTUM-SIZE EFFECT IN ALUMINUM FILMS UP TO TWELVE ATOMS THICK

机译:直到十二个原子厚的铝膜中的永久量子尺寸效应

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摘要

Total energies and work functions have been calculated for unrelaxed, free-standing Al(111) films, 1-12 layers thick, using the all-electron, full-potential linear combination of Gaussian-type orbitals-fitting-function technique. The work function exhibits a significant quantum-size effect (at least 0.1 eV) over the entire range of thickness considered. This result contradicts an old prediction that the work function of an Al(111) N-layer film will converge to within a few hundredths of an eV by N=6. The present result, which is consistent with earlier jellium calculations, demonstrates the risk of mistaking an accidental coincidence of work functions for two films, differing in thickness by one layer,for a true convergence with respect to thickness. The implications for thin-film calculations of surface properties are discussed. A linear fit to the film binding energy vs thickness is used to extract the Al(111) surface energy (0.45 eV) and the binding energy of bulk Al (4.06 eV). [References: 23]
机译:使用高斯型轨道拟合函数技术的全电子全势线性组合,计算了厚度为1至12层的无松弛,独立式Al(111)薄膜的总能量和功函数。在所考虑的整个厚度范围内,功函数表现出显着的量子尺寸效应(至少0.1 eV)。这个结果与一个古老的预测相矛盾,即Al(111)N层膜的功函数将收敛到eV的百分之几以内N = 6。目前的结果与早期的胶体计算相吻合,证明了误将功函数的偶然巧合误认为是两层厚度相差一层的膜,以实现厚度的真正收敛。讨论了薄膜薄膜表面性能的含义。膜结合能与厚度的线性拟合用于提取Al(111)表面能(0.45 eV)和本体Al的结合能(4.06 eV)。 [参考:23]

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