机译:Deposition of monolayers by retraction from solution: Ellipsometric study of cetyltrimethylammonium bromide adsorption at silica-air and silica-water interfaces
机译:X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of Hg(I) and sulfate adsorption processes accompanying the coulostatic underpotential deposition of mercury on gold
机译:Dynamic scaling exponents of copper electrodeposits from scanning force microscopy imaging. Influence of a thiourea additive on the kinetics of roughening and brightening
机译:Effect of cyclization on the association behavior of block copolymers in aqueous solution. Comparison of oxyethylene/oxypropylene block copolymers cyclo-P34E104 and E52P34E52