Photonic devices fabricated with photonic area lithographically mapped process.

摘要

In this dissertation, we propose the Photonic Area Lithographically Mapped (PALM) technique which is a hybrid process of conventional and holographic lithography. Holographic lithography is especially powerful in patterning submicron gratings, as well as 2-D and 3-D Photonic Crystals over a wide area. However in contrast to electron beam lithography which can place the "photonic atoms" (gratings, posts or holes) anywhere over the whole wafer, holographic lithography cannot control the placement of those elements. With PALM technique, photonic atoms region can be defined by conventional lithography at precisely designated location, in desired shape and dimensions. Subsequently, holographic lithography parallel patterns photonic atoms at defined area. PALM technique is a high throughput and low cost process that can be applied to fabricate many classes of devices. Those photonic atoms areas can be precisely placed with respect to conventional (micron) size features size features, such as waveguides, sources and detectors to realize high density integrated optics. It provides a way to realize low-cost, high volume fabrication of planar lightwave circuits.;As a proof of concept, three photonic devices have been implemented with PALM technique; low loss, small area right angle waveguide bends, wire-grid micropolarizer arrays for polarization resolved imaging and structures for high efficacy tungsten thermal emitters.