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25th Annual BACUS Symposium on Photomask Technology pt.1

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1.Impact of DUV exposure on reticle repairs

机译：DUV暴露对标线修复的影响
- 作者：Vikram L. Tolani;Scott Chegwidden;Edgar C. Buenconsejo;Daniel Tanzil;Daniel J. Bald
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- exposure;
- DUV;
- FIB;
- focused ion beam;
- repair;
- defect;
- overspray;
- halo;
- carbon;
- deposition;
- reticle;
- photomask;
2.Post coat delay effects on chemically amplified resists and storage condition impacts

机译：涂后延迟对化学放大的抗蚀剂的影响以及存储条件的影响
- 作者：Daniel B. Sullivan;Kenneth C. Racette;Monica J. Barrett;R. Brian Couture
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- chemically amplified resist;
- post coat delay;
- photoresist;
- critical dimension control;
- storage conditions;
3.Pattern Fidelity Performance from Next-Generation DUV Laser Lithography on 65nm Masks and Wafers

机译：下一代DUV激光光刻在65nm掩模和晶圆上的图案保真度性能
- 作者：Robert Kiefer;Peter Buck;Vishal Garg;Jason Hickethier;Curt Jackson;John Manfredo;Cris Morgante;Paul Allen;Michael White
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- CD uniformity;
- DUV;
- mask pattern generation system;
- multi-beam;
- OPC;
- pattern fidelity;
4.Pattern type specific modeling and correction methodology at high NA and off-axis illumination

机译：在高NA和偏轴照明下特定于图案类型的建模和校正方法
- 作者：Sungsoo Suh;Young-seog Kang;In-sung Kim;Sang-gyun Woo;Hanku Cho;Joo-tae Moon
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- lithography;
- optical proximity correction;
- model OPC;
- OPC verification;
5.Real-World Impact of Inverse Lithography Technology

机译：反光刻技术的现实影响
- 作者：Jonathan Ho;Yan Wang;Xin Wu;Wolfgang Leitermann;Benjamin Lin;Ming Feng Shieh;Jie-wei Sun;Orson Lin;Jason Lin;Yong Liu;Linyong Pang
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- inverse lithography technology (ILT);
- OPC;
- RET;
- lithography;
6.Process Window Impact of Progressive Mask Defects, its Inspection and Disposition Techniques (go / no-go criteria) via a Lithographic Detector

机译：渐进式掩模缺陷的工艺窗口影响，其检查和处置技术（通过/不通过标准）通过光刻检测器
- 作者：Jerry Huang;Lan-Hsin Peng;Chih-Wei Chu;Kaustuve Bhattacharyya;Ben Eynon;Farzin Mirzaagha;Tony Dibiase;Kong Son;Jackie Cheng;Ellison Chen;Den Wang
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask defects;
- inspection;
- crystal growth;
- progressive;
- MEEF;
- lithography;
- process window;
7.Optical DC overlay measurement in the 2nd level process of 65 nm Alternating Phase Shift Mask

机译：65 nm交替相移掩模的第二层处理中的光学DC覆盖测量
- 作者：Jian Ma;Ke Han;Kyung Lee;Yulia Korobko;Mary Silva;Joas Chavez;Brian Irvine;Sven Henrichs;Kishore Chakravorty;Robert Olshausen;Mahesh Chramouli;Bobby Mammen;Ramaswamy Padmanaban
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- Mask;
- APSM;
- Optical;
- Overlay;
- 2nd level;
- Tool-induced shift;
- Mask-induced shift;
8.Model-based insertion and optimization of assist features with application to contact layers

机译：基于模型的辅助功能的插入和优化，并应用于接触层
- 作者：Shumay D. Shang;Yuri Granik;Lisa Swallow;Li-guo Zhang;Travis Brist;res Torres
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
9.MOBILE METROLOGY FOR ADVANCED PHOTOMASK MANUFACTURING

机译：先进的光掩模制造的移动计量
- 作者：Paul MacDonald;Michael P. Goudy;Devi Koty;Henryson Omoregie;M. David Webster
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
10.Modeling OPC Complexity for Design for Manufacturability

机译：为可制造性设计的OPC复杂性建模
- 作者：Puneet Gupta;rew B. Kahng;Swamy Muddu;Sam Nakagawa;Chul-Hong Park
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- OPC;
- fracturing;
- mask cost;
- DFM;
11.Mask Industry Assessment: 2005

机译：口罩行业评估：2005年
- 作者：Gilbert Shelden;Scott Hector
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask industry;
- photomask;
- industry;
- mask yield;
- photomask yield;
- mask quality;
- photomask quality;
12.Mask Design Rules (45 nm) - Time for Standardization

机译：掩模设计规则（45 nm）-标准化时间
- 作者：Mark Mason;Christopher J. Progler;Patrick Martin;Young-Mog Ham;Brian Dillon;Robert Pack;Mitch Heins;John Gookassian;John Garcia;Victor Boksha
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
13.Mask Data Volume - Explosion or Damp Squib?

机译：面罩数据量-爆炸还是潮湿？
- 作者：Chris Spence;Scott Goad
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- optical proximity correction (OPC);
- mask data prep (MDP);
- variable shaped beam (VSB);
14.Mask Pattern Quality Assurance based on Lithography Simulation with Fine Pixel SEM Image

机译：基于光刻的精细像素SEM图像掩模图案质量保证
- 作者：Mitsuyo Kariya;Eiji Yamanaka;Satoshi Tanaka;Takahiro Ikeda;Shinji Yamaguchi;Kohji Hashimoto;Masamitsu Itoh;Hideaki Kobayashi;Tsukasa Kawashima;Shogo Narukawa
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- SEM;
- edge extraction;
- lithography simulation;
- optical proximity correction (OPC);
15.Integration of Photolithographic Simulation and a Mask Repair System into a Single Concurrent Work Cell

机译：将光刻模拟和掩模修复系统集成到单个并行工作单元中
- 作者：Tod Robinson;Peter Brooker;Ron Bozak;David A. Lee
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- nanomachining;
- AFM;
- mask repair;
- aerial image;
- photolithography simulation;
16.Improved file sizes and cycle times through optimization of GDSII Stream

机译：通过优化GDSII流，改善了文件大小和循环时间
- 作者：Chin Le;David Gariepy
- 会议名称：《》 | 2005年
- GDSII Stream;
- optimization;
- compression;
- tape-out;
17.Implementation of Reflected light Die-to-Die Inspection and ReviewSmart to Improve 65nm DRAM Mask Fabrication

机译：实施反射光芯片对芯片检查和ReviewSmart以改善65nm DRAM掩模的制造
- 作者：Do Young Kim;Won Il Cho;Jin Hyung Park;Dong Hoon Chung;Byung Chul Cha;Seong Woon Choi;Woo Sung Han;Ki Hun Park;Nam Wook Kim;Carl Hess;Weimin Ma;David Kim
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- KLA5xx;
- reviewsmart;
- samsung;
- DRAM;
- ddR (die to database reflected) inspection;
- pattern orientation and pattern background;
18.Image enhancement technology to get fine defect image for FIB

机译：图像增强技术可获取FIB的精细缺陷图像
- 作者：Yongkyoo Choi;Heecheon Kim;Oscar Han
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask;
- FIB;
- nonlinear diffusion filter;
- defect;
- extraction;
- image enhancement. review;
19.Image imbalance compensation in alternating Phase-Shift Masks towards the 45 nm node through-pitch imaging

机译：朝着45 nm节点通距成像交替相移掩模中的图像不平衡补偿
- 作者：Lieve Van Look;Bryan Kasprowicz;Axel Zibold;Wolfgang Degel;Geert Venberghe
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- alternating phase-shift mask;
- intensity imbalance;
- image imbalance;
- 3D-mask simulation;
- aerial image;
20.Economic consequences of high throughput maskless lithography

机译：高通量无掩模光刻的经济后果
- 作者：John G. Hartley;Lakshmi Govindaraju
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- maskless;
- lithography;
- economics;
- modeling;
21.Evaluation of Transparent Etch Stop Layer phase shift mask patterning and comparison with the single trench undercut approach

机译：透明蚀刻停止层相移掩模图案的评估以及与单沟槽底切方法的比较
- 作者：Y. Rody;P. Martin;C. Couderc;P. Sixt;C. Gardin;K. Lucas;K. Patterson;C. Miramond-Collet;J. Belledent;R. Boone;A. Borjon;Y. Trouiller
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- AAPSM;
- Mask technology;
- OPC;
- TESL;
22.Evaluation of quartz dry etching performance for next generation phase-shift mask applications

机译：评估下一代相移掩模应用中的石英干蚀刻性能
- 作者：S. A. erson;T. Konishi;R. Koch;S. Yokoi;A. Kumar;I. Ibrahim
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- alt-PSM;
- dry etch;
- etch rate uniformity;
- mask etch;
- micro-trenching;
- phase angle uniformity;
- phase shift;
- PSM;
- quartz etch;
- RET;
- RIE Lag;
23.EUVL Mask Manufacturing-Technologies and Results

机译：EUVL掩模制造技术和结果
- 作者：Florian Letzkus;Joerg Butschke;Mathias Irmscher;Holger Sailer;Uwe Dersch;Christian Holfeld
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- EUV mask;
- dry etch;
- absorber;
- buffer;
- proximity correction;
24.Expanding Grayscale Capability of Direct-Write Grayscale Photomask By Using Modified Bi/In Compositions

机译：通过修改的Bi / In成分扩展直接写入灰度光掩模的灰度功能
- 作者：David K. Poon;Glenn H. Chapman;Chinheng Choo;Jun Wang;Yuqiang Tu;Michelle L. La Haye
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- direct-write photomask;
- grayscale photomask;
- expanding grayscale;
- bimetallic thermal resist;
- MEMS;
25.Demonstration of a new mask structure using a bonded hard pellicle

机译：演示使用粘合硬质薄膜的新型掩模结构
- 作者：Philippe Thony;Beatrice Biasse;Marc Zussy;Giovanni Bianucci;Pietro Cantu;Daniel Henry
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask structure;
- direct bonding;
- hard pellicle;
- aberration;
26.Designing to Win in Sub-90nm Mask Production

机译：设计赢得90nm以下掩模生产
- 作者：Yuan Zhang
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- design for manufacturing;
- write time;
- OPC;
- mask cost;
- magnification;
27.DfM Requirements and ROI Analysis for System-on-Chip

机译：片上系统的DfM要求和ROI分析
- 作者：Artur Balasinski
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- design;
- system-on-chip;
- manufacturability;
- design rules;
- CAD flow;
- ROI;
- FMEA;
28.DFM for Manufacturers and Designers

机译：制造商和设计师的DFM
- 作者：Philippe Hurat;Michel Cote
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
29.Compensating Mask Topography Effects in CPL through-pitch Solutions toward the 45nm Node

机译：补偿CPL通距解决方案中朝向45nm节点的掩模形貌影响
- 作者：Joost Bekaert;Vicky Philipsen;Geert Venberghe;Doug van den Broeke;Wolfgang Degel;Axel Zibold
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- chromeless phase lithography;
- mask topography;
- bossung tilt;
- mask etch depth;
- rigorous 3D mask simulation;
30.Characterization of Photomask Surface Cleaning with Cryogenic Aerosol Technique

机译：低温气溶胶技术对光掩模表面清洁的表征
- 作者：S. Banerjee;CC Lin;S. Su;C. Bowers;H. F. Chung;W. Brt;K. Tang
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- CO_2 aerosol;
- post-repair cleaning;
- photomask;
- particle removal;
- haze;
- phase and transmission change;
- ESD;
31.Calibration of compact OPC models using SEM contours

机译：使用SEM轮廓校准紧凑型OPC模型
- 作者：Yuri Granik
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- optical lithography;
- optical proximity correction;
- OPC;
- resolution enhancement techniques;
- RET;
- metrology;
- critical dimension;
32.Applying reconfigurable RET across process window to create more robust manufacturing designs

机译：在整个过程窗口中应用可重新配置的RET，以创建更可靠的制造设计
- 作者：Mark Laurance;Abhishek Vikram;Melody Ma;William Volk;Melissa erson;Scott rews;Bo Su;Hong Du;Gaurav Verma
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- OPC;
- halo;
- optical proximity correction;
- RET;
- OPC reconfiguration;
- process window;
- Halo-OPC;
- DesignScan;
33.Advanced mask cleaning techniques for sub-100-nm technology nodes

机译：低于100纳米技术节点的先进掩模清洗技术
- 作者：James S. Papanu;Roman Gouk;Cole Franklin;Han-Wen Chen;Steven Verhaverbeke;Alexer Ko;Kent Child;Pieter Boelen;Suresh Shrauti;Elias Martinez;Brian J. Brown
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- photomasks;
- wet cleaning;
- ozonated DI;
- dry strip;
34.A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging

机译：针对65 nm节点的光刻错误预算优化的新策略：超NA成像的掩模规格
- 作者：Kazuya Iwase;Kiichi Ishikawa;Koichi Takeuchi;Ken Ozawa;Fumikatsu Uesawa
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- immersion lithography;
- mask;
- specification;
- hyper-NA;
- printability;
- error budget;
35.A study of Cr to Mosi in-situ. dry etching process to reduce plasma induced defect

机译：Cr到Mosi的原位研究。干蚀刻工艺可减少等离子体引起的缺陷
- 作者：Il-Yong Jang;Young-Ju Park;Hyuk-Joo Kwon;Seong-Yong Moon;Seong-Woon Choi;Woo-Sung Han
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- photomask;
- Cr;
- MoSiON;
- in-situ. dry etch;
- plasma;
- chlorine;
36.A Films Based Approach to Intensity Imbalance Correction for 65 nm Node c:PSM

机译：基于膜的65 nm节点c：PSM强度不平衡校正的方法
- 作者：R Cottle;Pierre Sixt;Matt Lassiter;Marc Cangemi;Patrick Martin;Chris Progler
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- AAPSM;
- c: PSM;
- TESL;
- RET;
- OPC;
- photomask;
- reticle;
- quartz etch;
37.A Mask Manufacturer's Perspective on Maskless Lithography

机译：掩模制造商对无掩模光刻的看法
- 作者：Peter Buck;Charles Biechler;Franklin Kalk
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask;
- photomask;
- maskless lithography;
- direct write lithography;
38.Gray scaling in high performance optical pattern generators

机译：高性能光学图案发生器中的灰度
- 作者：Hans Martinsson;Tor Sstrom
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- gray scaling;
- address resolution;
- partial coherence;
- SLM;
39.Fracture Friendly Optical Proximity Correction

机译：骨折友好型光学邻近矫正
- 作者：Frank Amoroso;Michel Cote;Tanya Do;Robert Lugg;John Nogatch
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- fracture;
- jogs;
- optical proximity correction (OPC);
- process bias;
- reverse tone;
- slivers;
40.The impact of mask birefringence on Hyper-NA (NA > 1.0) Polarized Imaging

机译：掩模双折射对Hyper-NA（NA> 1.0）偏振成像的影响
- 作者：Bernd Geh;Donis G. Flagello;Chris Progler;Patrick M. Martin;Leonardus H.A. Leunissen;Steve Hansen;Wim de Boeij
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- hyper NA;
- High NA;
- polarization;
- imaging;
- immersion;
- 193nm;
- low k1;
- mask birefringence;
- Stokes parameters;
41.The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing

机译：Qz相位缺陷的可检测性及其在65 nm节点CPL掩模制造中的应用
- 作者：Won Il Cho;Jin Hyung Park;Dong Hoon Chung;Sung Woon Choi;Woo Sung Han
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- RET;
- chrome-less phase lithography;
- CPL;
- Qz phase defect;
- inspection;
- defect printability;
42.Through-Process Window Resist Modelling Strategies for the 65 nm node

机译：65 nm节点的全过程窗口抵抗建模策略
- 作者：Amine Borjon;Jerome Belledent;Yorick Trouiller;Kyle Patterson;Kevin Lucas;Christophe Couderc;Frank Sundermann;Jean-Christophe Urbani;Stanislas Baron;Yves Rody;Christian Gardin;Frank Foussadier;Patrick Schiavone
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- OPC;
- resist modelling;
- process window;
- ORC;
- failure prediction;
43.The surface treatment for prevention of growing defect

机译：表面处理，防止生长缺陷
- 作者：Jea-Young Jun;Ji-Sun Ryu;Yongk-Yoo Choi;Oscar Han
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- heat treatment;
- haze;
- roughness;
- surface damage;
- plasma damage;
44.RIM-13: A high-resolution imaging tool for aerial image monitoring of EUV reticles

机译：RIM-13：一种用于EUV标线空中图像监视的高分辨率成像工具
- 作者：M Booth;A Brunton;J Cashmore;P Elbourn;G Elliner;M Gower;J Greuters;J Hirsch;L Kling;N McEntee;P Richards;V Truffert;I Wallhead;M Whitfield;R Hudyma
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- EUV lithography;
- exposure;
- inspection;
- metrology;
- aerial image monitoring;
- reticle imaging microscope;
45.Semiconductor Pattern Analysis with Induced Polarization

机译：感应极化的半导体图案分析
- 作者：Tao Chen;Tom Milster;Seung Hune Yang
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- induced polarization imaging;
- solid immersion lens (SIL);
- near-field microscope;
- high resolution;
46.Photomasks Registration Specification and Its impact on FLASH Memory Devices

机译：光掩模注册规范及其对闪存设备的影响
- 作者：Enio Carpi;Stuart Brown;Florence Tan;Rick Edwards
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- scanner overlay correction;
- mask registration;
- FLASH memory;
- exploratory data analysis;
47.Performance of the ALTA 4700 with variable print strategy and optimized resist process

机译：采用可变印刷策略和优化的抗蚀剂工艺的ALTA 4700的性能
- 作者：Paul C. Allen;H. Christopher Hamaker;Cris Morgante;rew Berwick;Michael White
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- CD uniformity;
- registration;
- CW laser;
- DUV;
- mask pattern generation system;
- multi-beam;
- multi-pass;
48.Mask Modeling in the Low k_1 and Ultrahigh NA Regime: Phase and Polarization Effects

机译：低k_1和超高NA条件下的掩模建模：相位和偏振效应
- 作者：Andreas Erdmann
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- lithography simulation;
- mask topography;
- mask polarization;
49.Generating Mask Inspection Rules for Advanced Lithography

机译：生成高级光刻的掩模检查规则
- 作者：Karen Badger;Bill Broadbent;Aditya Dayal;Emily Gallagher;ChingYun Hsiang;Vincent Redding
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- MRC;
- inspectability;
- sensitivity;
- DUV inspection;
- database;
- STARlight;
- OPC;
50.Haze Prevention and Phase/Transmission Preservation through Cleaning Process Optimization

机译：通过清洁工艺优化防止雾霾和相位/传输
- 作者：Jennifer Qin;Yuan Zhang;Rob Delgado;Barry Rockwell;Florence Tan;Khoi Phan;Lothar Berger;Min Liu;Uwe Dietez
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- haze;
- mask cleaning;
- phase;
- transmission;
- ion chromatography;
51.First 65nm Tape-Out Using Inverse Lithography Technology (ILT)

机译：使用反光刻技术（ILT）的首个65nm出带
- 作者：Chi-Yuan Hung;Bin Zhang;Deming Tang;Eric Guo;Linyong Pang;Yong Liu;rew Moore;Kechang Wang
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- inverse lithography technology (ILT);
- OPC;
- RET;
- lithography;
- SRAM;
- 65nm technology;
52.Vectorial effects in subwavelength mask imaging

机译：亚波长掩模成像中的矢量效应
- 作者：Wen-Hao Cheng;Jeff Farnsworth;Theodore M. Bloomstein;rew Grenville
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- ArF immersion lithography;
- mask;
- topography;
- polarization;
- resonance;
- diffraction;
- off axis illumination;
- pellicle transmission;
53.The Photomask Technologies in Hyper-NA Lithography

机译：超NA光刻中的光掩模技术
- 作者：Hidehiro Watanabe;Hidetoshi Ohnuma
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- photomask;
- lithography;
- immersion;
- hyper NA;
54.The impact of attenuated phase shift mask topography on hyper-NA lithography

机译：衰减相移掩模形貌对超NA光刻的影响
- 作者：Chris A. Mack;Mark D. Smith;Trey Graves
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- lithography modeling;
- mask topography;
- PROLITH;
55.The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments

机译：面具设备制造商的艰难商业模式以及财团和政府对面具基础设施开发的支持
- 作者：Scott Hector
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- masks;
- mask equipment;
- business model;
- discounted cash flow;
- cost of ownership;
- cost models;
56.Template Manufacturing for Nanoimprint Lithography Using Existing Infrastructure

机译：使用现有基础设施制造纳米压印光刻的模板
- 作者：Mathias Irmscher;Joerg Butschke;Guenter Hess;Florian Letzkus;Markus Renno;Holger Sailer;Hubert Schulz;Anatol Schwersenz;Ecron Thompson;Boris Vratzov
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- chemically amplified resist;
- nanoimprint;
- template manufacturing;
- e-beam lithography;
57.Tolerable CD Variation Analyzer Using Perturbed Nominal Models Demonstrated on altPSM

机译：使用altPSM演示的扰动名义模型的可容忍CD变异分析器
- 作者：Ioana Graur;James A Culp;James Bruce;Mohamed Al-Imam;Mohamed Bahnas
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
58.Reduction of MDP complexity through the application of OASIS based data flow

机译：通过基于OASIS的数据流的应用降低MDP复杂性
- 作者：Sung-Hoon Jang;Ji-Hyeon Choi;Ji-Soong Park;Seong-Woon Choi;Woo-Sung Han
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask data preparation;
- MDP;
- photomask;
- GDSII;
- OASIS;
- VSB11;
- MEBES;
- MRC;
- fracturing;
- verification;
59.Simulation-based photomask qualification using i-Virtual Stepper™

机译：使用i-Virtual Stepper™基于仿真的光掩模认证
- 作者：Darren Taylor;Ray Morgan;Susan Hu
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- simulation-based defect disposition;
- photomask qualification;
- inspection;
- i-virtual stepper;
- i-VSS;
60.Production performance of a Sigma7300 DUV Mask Writer

机译：Sigma7300 DUV Mask Writer的生产性能
- 作者：Bob Olshausen;Mahesh Chramouli;Dustin Wall;Bruce Auches;Damon Cole
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- PSM;
- DUV;
- SLM;
- mask writer;
61.OPC for Edge Post Structures Using Chrome-less Phase Shifting Mask in 3-D Memory

机译：OPC在3-D存储器中使用无铬相移掩模的边缘柱结构
- 作者：Yung-Tin Chen;M.T. Lee
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- OPC;
- Post printing;
- Adjustable transmission;
- 3-D memory;
- Chrome-less phase shifting mask;
62.OPC with Customized Asymmetric Pupil Illumination Fill

机译：具有定制的不对称瞳孔照明填充的OPC
- 作者：Christof Bodendorf;Jens Hassmann;Thomas Muelders;Karin Kurth;Joerg Thiele
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- optical lithography;
- customized illumination;
- anisotropic mapping;
- optical proximity effect;
- OPC;
63.Optimized distributed computing environment for mask data preparation

机译：优化的分布式计算环境，用于掩模数据准备
- 作者：Byoung-Sup Ahn;Ju-Mi Bang;Min-Kyu Ji;Sun Kang;Sung-Hoon Jang;Yo-Han Choi;Won-Tai Ki;Seong-Woon Choi;Woo-Sung Han
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- distributed computing;
- mask data preparation;
- optical proximity correction;
64.Noble development system to achieve defect-free process for 65nm node photomasks

机译：Noble开发系统可实现65nm节点光掩模的无缺陷工艺
- 作者：Hironori Sasaki;Shuichi Sanki;Ryugo Hikichi;Kiyoshi Ogawa;Akihiko Naito;Yukihiro Sato;Yasuyuki Kushida;Naoyuki Ishiwata;Hiroshi Maruyama
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- defects;
- development;
- CARs;
- Bar-nozzle;
65.Mask Lithography Assessment for 45nm Node Technology

机译：45nm节点技术的掩模光刻技术评估
- 作者：R. Scott Mackay;Henry Kamberian;Barry Rockwell
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- photomask: e-beam lithography;
- pattern generator;
66.Magnetron reactive sputtering of TaN and TaON films for EUV mask applications

机译：用于EUV掩模的TaN和TaON膜的磁控反应溅射
- 作者：Kyung m Lee;Malahat Tavassoli;Alan Stivers;Barry Lieberman
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- EUV;
- sputter deposition;
- tantalum nitride;
- TaN;
- tantalum oxinitride;
- TaON;
67.Laser and E-beam Mask-to-Silicon with Inverse Lithography Technology (ILT)

机译：反向光刻技术（ILT）的激光和电子束掩模到硅
- 作者：Linyong Pang;Nader Shamma;Paul Rissman;Dan Abrams
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- mask writing;
- inverse lithography technology (ILT);
- OPC;
- RET;
- Lithography;
- CoG;
- AttPSM;
68.Implications of wafer design for manufacturing practices on photomask manufacturing

机译：晶圆设计对光掩模制造中制造实践的影响
- 作者：rew Watts;Jed Rankin;Christopher Magg
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- photomask manufacturing;
- design for manufacturing;
69.Improvement in defect classification efficiency by grouping disposition for reticle inspection

机译：通过对掩模版检查进行分组处理来提高缺陷分类效率
- 作者：Rick Lai;Luke T.H. Hsu;Peter Chang;C.H. Ho;Frankie Tsai;Garrett Long;Paul Yu;John Miller;Vincent Hsu;Ellison Chen
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- reticle inspection;
- defect review;
- reviewsmart;
- terascan;
- defect grouping;
- binning efficiency;
70.Impact of Photolithography and Mask Variability on Interconnect Parasitics

机译：光刻和掩模可变性对互连寄生的影响
- 作者：Yuxin Tian;Weiping Shi;M. Ray Mercer
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- parasitic extraction;
- DFM;
- lithography simulation;
- mask variability;
71.Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

机译：用于65nm设计节点工艺的TeraScan反射光裸片到数据库检查模式的评估和实现
- 作者：Luke T. H. Hsu;C.H. Ho;C. C. Lin;Vincent Hsu;Ellison Chen;Paul Yu;Kong Son
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
72.Design and Fabrication of Highly Complex Topographic Nano-imprint Template for Dual Damascene Full 3-D Imprinting

机译：双镶嵌全3D压印的高度复杂的地形纳米压印模板的设计与制作
- 作者：Susan MacDonald;Greg Hughes;Michael Stewart;Frank Palmieri;C. Grant Willson
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- nano-imprint;
- template;
- dual damascene;
- 3-D structures;
- SFIL;
73.Double Exposure Technique for 45nm node and Beyond

机译：45nm及更高节点的双重曝光技术
- 作者：Stephen Hsu;Jungchul Park;Douglas Van Den Broeke;J. Fung Chen
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- double exposure technique;
- DET;
- double dipole lithography;
- DDL;
- double pattering;
- CPL;
- scattering bars;
- SB;
- full-sized SB;
- FSB;
- model based layout conversion;
- double exposure lithography;
- DEL;
- coloring;
- coloring line method (CLN);
- coloring space method (;
74.CD metrology of Binary and Phase shift masks using Scatterometry

机译：使用散射法的二元和相移掩模的CD计量
- 作者：Kyung m Lee;Sanjay Yedur;Milad Tabet;Malahat Tavassoli
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- scatterometry;
- PSM;
- CD metrology;
75.Benchmark of FEM, Waveguide and FDTD Algorithms for Rigorous Mask Simulation

机译：严格掩模仿真的FEM，波导和FDTD算法的基准
- 作者：Sven Burger;Roderick Koehle;Lin Zschiedrich;Weimin Gao;Frank Schmidt;Reinhard Maerz;Christoph Noelscher
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- photomask simulation benchmark;
- photolithography;
- phase shift mask;
- FEM;
- FDTD;
76.Antireflection solutions for next generation 193-nm binary and phase-shifting masks

机译：下一代193 nm二进制和相移掩模的抗反射解决方案
- 作者：Hans Becker;Markus Renno;Ulrich Hermanns;Holger Seitz;Ute Buttgereit;Konrad Knapp;Guenter Hess
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- antireflection;
- AR;
- flare;
- 193 nm;
- binary;
- PSM;
- inspection;
77.Approaching Zero Etch Bias at Cr Etch Process

机译：在Cr蚀刻工艺中接近零蚀刻偏差
- 作者：Pavel Nesladek;Norbert Falk;reas Wiswesser;Renee Koch;Bjoern Sass
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- Cr dry etch;
- etch bias reduction;
- CD Uniformity;
- linearity;
- loading effect;
78.Applying Assist Features to Improve Two Dimensional Feature Process Robustness

机译：应用辅助特征以改善二维特征过程的鲁棒性
- 作者：Lawrence S. Melvin III;Benjamin D. Painter;Levi D. Barnes
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- sub-resolution assist feature;
- manufacturing sensitivity model;
- two-dimensional feature;
79.Advanced manufacturing rules check (MRC) for fully-automated assessment of complex reticle designs

机译：先进的制造规则检查（MRC）可对复杂的标线设计进行全自动评估
- 作者：R.Gladhill;D. Aguilar;P.D. Buck;D. Dawkins;S. Nolke;J. Riddick;J.A. Straub
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- manufacturing rules check;
- MRC;
- mask data inspection;
- mask data preparation;
- design for manufacturing;
- DFM;
80.Advanced Reticle Inspection Challenges and Solutions for 65nm-node

机译：65nm节点的高级光罩检查挑战和解决方案
- 作者：Won D. Kim;Mark D. Eickhoff;David Kim;Sy McCurley
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
81.A Practical Alternating PSM Modeling And OPC Approach To Deal With 3D Mask Effects For The 65nm Node And Beyond

机译：实用的交替PSM建模和OPC方法来处理65nm及以上节点的3D掩模效果
- 作者：Martin Drapeau;Paul. J.M. van Adrichem;Lieve van Look;Bryan S. Kasprowicz
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
82.65 nm node photomask etching with zero CD process bias

机译：零CD工艺偏置的65 nm节点光掩模蚀刻
- 作者：Banqiu Wu;Jeff Chen;Ed Markovitz;Guangming Xiao;Simon Tam;Ajay Kumar;Ibrahim Ibrahim;Wai-Fan Yau
- 会议名称：《》 | 2005年
- photomask etch;
- etch bias;
- 65 nm etch;
- zero bias;
83.Photomask process development for next generation lithography

机译：下一代光刻的光掩模工艺开发
- 作者：Shiho Sasaki;Kimio Itoh;Akiko Fujii;Nobuhito Toyama;Hiroshi Mohri;Naoya Hayashi
- 会议名称：《25th Annual BACUS Symposium on Photomask Technology pt.1》 | 2005年
- imprint;
- 1X masks;
- higher resolution;
- mold;