首页>外文会议>其他>Materials Research Society Symposium on Functional Oxide Thin Films and Heterostructures for Innovative Devices

Materials Research Society Symposium on Functional Oxide Thin Films and Heterostructures for Innovative Devices

召开年：
召开地：
出版时间：-

会议文集：-

会议论文

热门论文

全部论文

全选（0）

1.Phonon Deformation Potential Constants of Wurtzite ZnO: A First-Principles Study

机译：Phonon变形潜在常数紫吨石ZNO：一项初原则研究
- 作者：Kazuhiro Shimada;Tomoyasu Hiramatsu;Hitoshi Kato
- 会议名称：《Materials Research Society Symposium on Functional Oxide Thin Films and Heterostructures for Innovative Devices》 | 2013年
2.Si Surface Orientation Dependence on the Electrical Characteristics of HfN Gate Insulator with sub-0.5 nm EOT Formed by ECR Plasma Sputtering

机译：Si表面取向依赖于ECR等离子溅射形成的亚0.5nm eot的HFN栅极绝缘体的电特性
- 作者：Nithi Atthi;Dae-Hee Han;Shun-ichiro Ohmi
- 会议名称：《Materials Research Society Symposium on Functional Oxide Thin Films and Heterostructures for Innovative Devices》 | 2013年
3.Si Surface Orientation Dependence on the Electrical Characteristics of HfN Gate Insulator with sub-0.5 nm EOT Formed by ECR Plasma Sputtering

机译：Si表面取向依赖于HFN栅极绝缘子的电气特性与ECR等离子体溅射形成的亚0.5nm eot
- 作者：Nithi Atthi;Dae-Hee Han;Shun-ichiro Ohmi
- 会议名称：《Materials Research Society Symposium on Functional Oxide Thin Films and Heterostructures for Innovative Devices》 | 2013年
4.Phonon Deformation Potential Constants of Wurtzite ZnO: A First-Principles Study

机译：纤锌矿ZnO声子形变势常数的第一性原理研究
- 作者：Kazuhiro Shimada;Tomoyasu Hiramatsu;Hitoshi Kato
- 会议名称：《Materials Research Society Symposium on Functional Oxide Thin Films and Heterostructures for Innovative Devices》 | 2013年