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Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing

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1.Elimination of monitor wafers in metal film process control

机译：消除金属薄膜过程控制中的监测晶片
- 作者：Walter H. Johnson;Dan Hobbs;Ron Jones;Gary Pors
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
2.Method of multilayer semiconductor structures cross section preparation for transmission electron microscopy

机译：多层半导体结构透射电子显微镜横截面准备方法
- 作者：Vladimir Y. Karasyov;Alexander V. Skornyakov;Mikhail G. Kuznetsov
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
3.In-situ particle monitoring: today's technology drivers

机译：原位粒子监测：今天的技术司机
- 作者：Peter Borden;Martin Elzingre;Derek Aqui
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
4.System integration for laser restructuring

机译：激光重组系统集成
- 作者：Wilfrido A. Moreno;Nitin Saini;Otto Acon
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
5.Resistor silicon dioxide and nitrite films ion etching process: in-situ monitoring using photoemission testing

机译：电阻器二氧化硅和亚硝酸薄膜离子蚀刻工艺：使用光映射测试的原位监测
- 作者：A.Kunitzin;Yuri Dekhtyar;Vladimir Noskov
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
6.Evaluation of ULPA/prefilter media for the reduction of airborne boron contamination

机译：对ULPA / PREILTER媒体进行评估，以减少空气硼污染
- 作者：John Squatrito;Raul Nanez;Dewey Keeton
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
7.Contamination control for ultrapure chemicals from microelectronics fab

机译：微电子工厂超纯化学品的污染控制
- 作者：Dumitru Ulieru
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
8.Neural manufacturing: a novel concept for processing modeling monitoring and control

机译：神经制造：一种用于处理建模监控和控制的新概念
- 作者：Chi Y. Fu;Loren Petrich;Benjamin Law
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
9.On-line exhaust gas analytics during plasma cleaning of PECVD facilities

机译：在线清洗PECVD设施中的在线废气分析
- 作者：Andreas E. Guber;Uwe Koehler
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
10.Effect of sputtering target crystallographic orientation on step coverage and collimation efficiency

机译：溅射靶晶体取向对步进覆盖和准直效率的影响
- 作者：Robert S. Bailey;Nicholas C. Hill
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
11.Development of cost of ownership modeling at a semiconductor production facility

机译：在半导体生产设施的所有制建模成本开发
- 作者：Raul Nanez;Armando Iturralde
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
12.Automation in semiconductor production minienvironments flexibility and information flow

机译：半导体生产中的自动化模型的灵活性和信息流量
- 作者：Ralf Dudde;Peter Staudt-Fischbach;Olaf Herzog
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
13.Spectral ellipsometry on patterned wafers

机译：图案晶片上的光谱椭圆图表
- 作者：Duncan W. Mills;Ronald L. Allen;Walter M. Duncan
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
14.SCA and SPV in line monitoring

机译：SCA和SPV在线监测
- 作者：Kathy Barla;D.Levy;A.Fleury;J.P. Reynard;L.Kwakman
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
15.Manufacturing challenges for sub-half-micron technologies

机译：下半微米技术的制造挑战
- 作者：Fu-Tai Liou
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
16.In-situ process monitoring in metal deposition processes

机译：金属沉积过程中原位过程监测
- 作者：Shigeru Kobayashi;Eisuke Nishitani;Hideaki Shimamura;Akira Yajima;Satoshi Kishimoto;Yuji Yoneoka;Hiroyuki Uchida;Natsuyo Morioka
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
17.Relationships between process fundamentals facility design and production control of semiconductor manufacturing systems

机译：过程基础设施设施设计与生产控制的关系
- 作者：Shannon Chen;Rieko C. Hase;Kaine Mordaunt;Reha M. Uzsoy;Christos G. Takoudis
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
18.In-situ wafer curvature measurements during rapid thermal annealing of Si(100) wafers

机译：在Si（100）晶片的快速热退火过程中原位晶片曲率测量
- 作者：J. Hans F. Jongste;T.G. Oosterlaken;G.C. Bart;G.C. Janssen;Sybrand Radelaar
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
19.Digital tester-based measurement methodology for process control in multilevel metallization systems

机译：基于数字测试仪的测量方法用于多级金属化系统过程控制
- 作者：Christopher Hess;Larg H. Weiland
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
20.Self-learning intellectual system of expert diagnostics of technological malfunctions in ULSI manufacturing

机译：ULSI制造业技术故障专家诊断专家诊断自学智力制度
- 作者：Peter A. Arutyunov;Mikhail G. Kuznetsov
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
21.Multiresolution pattern detector networks for controlling plasma etch reactors

机译：用于控制等离子体蚀刻反应器的多分辨率模式检测器网络
- 作者：Ronald L. Allen;Randy Moore;Mike Whelan
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
22.Control of CVD precursor purity for integrated circuit manufacture

机译：控制集成电路制造的CVD前体纯度
- 作者：David A. Roberts;Hans J. Graf;Michael J. Halberstadt
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年
23.Materials delivery challenges in ULSI processing

机译：ULSI加工中的材料交付挑战
- 作者：James F. Loan;Laura A. Sullivan;John J. Sullivan
- 会议名称：《Conference on Process,Equipment,and Materials Control in Integrated Circuit Manufacturing》 | 1995年