首页>外文会议>Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS

Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS

召开年：2020
召开地：San Jose(US)
出版时间：-

会议文集：-

会议论文

热门论文

全部论文

全选（0）

1.Selective electroless plating on non-conductive materials by applying a gradient of magnetic field

机译：通过施加磁场梯度在非导电材料上进行选择性化学镀
- 作者：S. Danilova;J. E. Graves;G. V. W. Cave;J. Sort;E. Pellicer;A. J. Cobley
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- electroless plating;
- magnetic nanoparticles;
- selective metallisation;
2.Maskless holographic schemes based on phase micromirror SLMs

机译：基于相位微镜SLM的无掩模全息方案
- 作者：M. Borisov;D. Chelubeev;V. Chernik;L. Merkushov;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- digital holography;
- dynamic hologram;
- holographic lithography;
- maskless lithography;
- dynamic mask;
3.Nanoimprint System Alignment and Overlay Improvement for High Volume Semiconductor Manufacturing

机译：用于大批量半导体制造的纳米压印系统对准和覆盖改善
- 作者：Atsushi Kimura;Yukio Takabayashi;Takehiko Iwanaga;Mitsuru Hiura;Keita Sakai;Hiroshi Morohoshi;Toshiya Asano;Tatsuya Hayashi;Takamitsu Komaki
- 会议名称：《》 | 2020年
- nanoimprint lithography;
- NIL;
- alignment;
- overlay;
- XXMO;
- TTM;
- HODC;
- throughput;
- simulation;
4.Development and Deployment of Advanced Multi-Beam Mask Writer

机译：先进的多光束口罩书写器的开发和部署
- 作者：Mahesh Chandramouli;Bin Liu;Reid K. Juday;Bassam Shamoun;Yulia Korobko;Andrew T. Sowers;Yoshihiro Tezuka;Frank E. Abboud
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- multi-beam;
- mask writer;
- lithography;
- photomask;
5.Development of Bovine Serum Albumin-based Resins for Additive Manufacturing via Vat Photopolymerization

机译：牛血清白蛋白基树脂用于通过增值税光聚合进行增材制造的开发
- 作者：Patrick T. Smith;Benjaporn Narupai;S. Cem Millik;Ryan T. Shafranek;Alshakim Nelson
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
6.Photothermal alternative to device fabrication using atomic precision advanced manufacturing techniques

机译：使用原子精密先进制造技术制造器件的光热替代方法
- 作者：A. M. Katzenmeyer;S. Dmitrovic;A. D. Baczewski;E. Bussmann;T.-M. Lu;E. M. Anderson;S. W. Schmucker;J. A. Ivie;D. M. Campbell;D. R. Ward;G. T. Wang;S. Misra
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- photolithography;
- photothermal effects;
- hydrogen lithography;
- surface morphology;
- nanoscale devices;
- scanned probe lithography;
7.Contribution ratio of process fidelity and beam accuracy in multi-beam mask writing

机译：多光束掩模写入中工艺保真度和光束精度的贡献率
- 作者：Rumi Ito;Yoshinori Kojima;Hiroshi Matsumoto
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- multi-beam;
- mask;
- process;
- LER;
8.Mathematical problems of holographic mask synthesis

机译：全息掩模合成的数学问题
- 作者：M. Borisov;D. Chelyubeev;V. Chernik;L. Merkushov;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Computer Generated Hologram;
- Fast Fourier Transform;
- phase-shift;
- optimization;
- steepest descent;
9.Addressing Nanoimprint Lithography Mix Match Overlay Using Drop Pattern Compensation

机译：使用液滴图案补偿解决纳米压印光刻混合和匹配覆盖问题
- 作者：Anshuman Cherala;Se-Hyuk Im;Mario Meissl;Logan Simpson;Ecron Thompson;Jin Choi;Mitsuru Hiura;Satoshi lino
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- nanoimprint lithography;
- NIL;
- overlay;
- HODC;
- drop pattern compensation;
- DPC;
10.Experimental verification of sub-wavelength holographic lithography (SWHL) concept

机译：亚波长全息光刻（SWHL）概念的实验验证
- 作者：M. Borisov;D. Chelubeev;V. Chernik;L. Merkushov;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- holographic lithography;
- holographic mask;
- computer generated hologram;
- digital holography;
- sub-wavelength lithography;
- 3D imaging;
11.Quantum Inspire - QuTech's platform for co-development and collaboration in Quantum Computing

机译：Quantum Inspire-QuTech的量子计算共同开发和协作平台
- 作者：Thorsten Last;Nodar Samkharadze;Pieter Eendebak;Richard Versluis;Xiao Xue;Amir Sammak;Delphine Brousse;Kelvin Loh;Henk Polinder;Giordano Scappucci;Menno Veldhorst;Lieven Vandersypen;Klara Maturova;Jeremy Veltin;Garrelt Alberts
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Quantum Computer;
- Quantum Device Manufacturing;
- Spin Qubit in Silicon;
- CMOS;
12.Lithography Today: Challenges and Solutions across a Diverse Market

机译：如今的光刻术：多元化市场中的挑战与解决方案
- 作者：Kazunori Iwamoto
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- lithography;
- photolithography;
- nanoimprint lithography;
- NIL;
- alignment;
- overlay;
- throughput;
13.Highly Efficient Neuromorphic Computing Systems with Emerging Nonvolatile Memories

机译：新兴的非易失性存储器的高效神经形态计算系统
- 作者：Brady Taylor;Ziru Li;Bonan Yan;Hai Li;Yiran Chen
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Memristor;
- ReRAM;
- Neuromorphic computing. Nonvolatile memory;
14.Atomically precise digital E-beam lithography

机译：原子精确数字电子束光刻
- 作者：J. N. Randall;J. H.G. Owen;E. Fuchs;R. Saini;R. Santini;S.O.R. Moheimani
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
15.Extending deep-UV multi-beam laser writing for optical and EUV masks

机译：扩展用于光学和EUV掩模的深紫外多光束激光写入
- 作者：H. Christopher Hamaker;Paul C. Allen
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- laser pattern generator;
- photomask;
- data path;
- corner rounding;
- throughput;
- EUV fiducial alignment;
16.An Introduction to the SemiSynBio Initiative and Selected Convergent Results

机译：SemiSynBio计划简介和部分收敛结果
- 作者：Daniel J.C. Herr
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
17.Nonlinear mode coupling in a MEMS resonator

机译：MEMS谐振器中的非线性模式耦合
- 作者：David A. Czaplewski;Daniel Lopez;Oriel Shoshani;Steven W. Shaw
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- MEMS;
- NEMS;
- non-linear;
- resonance;
- bifurcation diagram;
- mode coupling;
- coupling strength;
18.Sub-Wavelength Holographic Lithography (SWHL)

机译：亚波长全息光刻（SWHL）
- 作者：M. Borisov;D. Chelyubeev;V. Chernik;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- holography;
- digital holography;
- lithography;
- computer generated hologram;
- holographic mask;
19.Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision

机译：基于尖端和激光的纳米加工，最大精度可达100毫米，亚纳米级
- 作者：Ingo Ortlepp;Michael Kiihnel;Martin Hofmann;Laura Weidenfeller;Johannes Kirchner;Shraddha Supreeti;Rostyslav Mastylo;Mathias Holz;Thomas Michels;Roland Fuessl;Ivo W. Rangelow;Thomas Frohlich;Denis Dontsov;Christoph Schaffel;Eberhard Manske
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- nanofabrication;
- nanopositioning;
- sub-nanometre precision;
- tip-based patterning;
- laser based lithography;
- extended working area;
20.A new approach to removing H atoms in hydrogen depassivation lithography

机译：氢钝化光刻中去除H原子的新方法
- 作者：S. O. Reza Moheimani;Harried Alemansour
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Scanning t unneling microscope;
- STM;
- Feedback controlled lithography;
- FCL;
- Hydrogen depassivation lithography;
- HDL;
21.Design and fabrication of microlens array homogenizer for laser beam shaping using Two Photon Polymerization

机译：双光子聚合激光成形微透镜阵列均质器的设计与制造
- 作者：Jia-Rong Wu;Hua-Yi Ni;Chien-Chung Fu;Wei-Jei Peng;Ting-Ming Huang;Ming-Fu Chen
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- microlens array;
- homogenizer;
- two photon polymerization;
- flat-top laser beam shaper;
22.Electron Beam Mask Writer EBM-8000P for High-throughput Mask Production

机译：电子束掩模写入机EBM-8000P，用于高通量掩模生产
- 作者：Tomohiro Iijima;Satoshi Nakahashi;Ryo Iikubo;Takahiro Honbu;Shinsuke Nishimura;Syoji Mori;Hirohiko Honda;Tsuyoshi Yamashita;Tetsurou Nishiyama;Osamu Kawami;Takao Tamura;Kenji Ohtoshi;Hirokazu Yamada
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- electron beam mask writer;
- throughput;
- CD uniformity;
- image placement;
- node;
23.Selective electroless plating on non-conductive materials by applying a gradient of magnetic field

机译：通过施加磁场梯度选择性化学电镀在非导电材料上
- 作者：S. Danilova;J. E. Graves;G. V. W. Cave;J. Sort;E. Pellicer;A. J. Cobley
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- electroless plating;
- magnetic nanoparticles;
- selective metallisation;
24.Maskless holographic schemes based on phase micromirror SLMs

机译：基于相位微镜SLMS的无掩模全息计划
- 作者：M. Borisov;D. Chelubeev;V. Chernik;L. Merkushov;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- digital holography;
- dynamic hologram;
- holographic lithography;
- maskless lithography;
- dynamic mask;
25.Mathematical problems of holographic mask synthesis

机译：全息掩模合成的数学问题
- 作者：M. Borisov;D. Chelyubeev;V. Chernik;L. Merkushov;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Computer Generated Hologram;
- Fast Fourier Transform;
- phase-shift;
- optimization;
- steepest descent;
26.Development of Bovine Serum Albumin-based Resins for Additive Manufacturing via Vat Photopolymerization

机译：牛血清白蛋白基树脂通过增值税光聚合的添加剂制造
- 作者：Patrick T. Smith;Benjaporn Narupai;S. Cem Millik;Ryan T. Shafranek;Alshakim Nelson
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
27.Development and Deployment of Advanced Multi-Beam Mask Writer

机译：高级多梁掩模作家的开发与部署
- 作者：Mahesh Chandramouli;Bin Liu;Reid K. Juday;Bassam Shamoun;Yulia Korobko;Andrew T. Sowers;Yoshihiro Tezuka;Frank E. Abboud
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- multi-beam;
- mask writer;
- lithography;
- photomask;
28.Nanoimprint System Alignment and Overlay Improvement for High Volume Semiconductor Manufacturing

机译：纳米压印系统对准和覆盖高批量半导体制造的改进
- 作者：Atsushi Kimura;Yukio Takabayashi;Takehiko Iwanaga;Mitsuru Hiura;Keita Sakai;Hiroshi Morohoshi;Toshiya Asano;Tatsuya Hayashi;Takamitsu Komaki
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- nanoimprint lithography;
- NIL;
- alignment;
- overlay;
- XXMO;
- TTM;
- HODC;
- throughput;
- simulation;
29.Photothermal alternative to device fabrication using atomic precision advanced manufacturing techniques

机译：使用原子精密先进制造技术的装置制造光热替代品
- 作者：A. M. Katzenmeyer;S. Dmitrovic;A. D. Baczewski;E. Bussmann;T.-M. Lu;E. M. Anderson;S. W. Schmucker;J. A. Ivie;D. M. Campbell;D. R. Ward;G. T. Wang;S. Misra
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- photolithography;
- photothermal effects;
- hydrogen lithography;
- surface morphology;
- nanoscale devices;
- scanned probe lithography;
30.Contribution ratio of process fidelity and beam accuracy in multi-beam mask writing

机译：多梁掩模写入中工艺保真度和光束精度的贡献比
- 作者：Rumi Ito;Yoshinori Kojima;Hiroshi Matsumoto
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- multi-beam;
- mask;
- process;
- LER;
31.Experimental verification of sub-wavelength holographic lithography (SWHL) concept

机译：子波长全息光刻（SWHL）概念的实验验证
- 作者：M. Borisov;D. Chelubeev;V. Chernik;L. Merkushov;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- holographic lithography;
- holographic mask;
- computer generated hologram;
- digital holography;
- sub-wavelength lithography;
- 3D imaging;
32.Addressing Nanoimprint Lithography Mix Match Overlay Using Drop Pattern Compensation

机译：寻址纳米压印光刻混合和匹配叠加使用滴图案补偿
- 作者：Anshuman Cherala;Se-Hyuk Im;Mario Meissl;Logan Simpson;Ecron Thompson;Jin Choi;Mitsuru Hiura;Satoshi lino
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- nanoimprint lithography;
- NIL;
- overlay;
- HODC;
- drop pattern compensation;
- DPC;
33.Quantum Inspire - QuTech's platform for co-development and collaboration in Quantum Computing

机译：Quantum Inspire - Qutech在量子计算中的共同开发和协作平台
- 作者：Thorsten Last;Nodar Samkharadze;Pieter Eendebak;Richard Versluis;Xiao Xue;Amir Sammak;Delphine Brousse;Kelvin Loh;Henk Polinder;Giordano Scappucci;Menno Veldhorst;Lieven Vandersypen;Klara Maturova;Jeremy Veltin;Garrelt Alberts
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Quantum Computer;
- Quantum Device Manufacturing;
- Spin Qubit in Silicon;
- CMOS;
34.Atomically precise digital E-beam lithography

机译：原子上精确的数字电子束光刻
- 作者：J. N. Randall;J. H.G. Owen;E. Fuchs;R. Saini;R. Santini;S.O.R. Moheimani
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
35.Lithography Today: Challenges and Solutions across a Diverse Market

机译：今天的光刻：各种市场挑战和解决方案
- 作者：Kazunori Iwamoto
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- lithography;
- photolithography;
- nanoimprint lithography;
- NIL;
- alignment;
- overlay;
- throughput;
36.Highly Efficient Neuromorphic Computing Systems with Emerging Nonvolatile Memories

机译：具有新出现的非易失性记忆的高效神经形态计算系统
- 作者：Brady Taylor;Ziru Li;Bonan Yan;Hai Li;Yiran Chen
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Memristor;
- ReRAM;
- Neuromorphic computing. Nonvolatile memory;
37.An Introduction to the SemiSynBio Initiative and Selected Convergent Results

机译：介绍了Semisynbio倡议和所选收敛结果
- 作者：Daniel J.C. Herr
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
38.Extending deep-UV multi-beam laser writing for optical and EUV masks

机译：用于光学和EUV面罩的深紫色多光束激光书写
- 作者：H. Christopher Hamaker;Paul C. Allen
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- laser pattern generator;
- photomask;
- data path;
- corner rounding;
- throughput;
- EUV fiducial alignment;
39.Nonlinear mode coupling in a MEMS resonator

机译：MEMS谐振器中的非线性模式耦合
- 作者：David A. Czaplewski;Daniel Lopez;Oriel Shoshani;Steven W. Shaw
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- MEMS;
- NEMS;
- non-linear;
- resonance;
- bifurcation diagram;
- mode coupling;
- coupling strength;
40.Sub-Wavelength Holographic Lithography (SWHL)

机译：子波长全息光刻（SWHL）
- 作者：M. Borisov;D. Chelyubeev;V. Chernik;V. Rakhovskiy;A. Shamaev
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- holography;
- digital holography;
- lithography;
- computer generated hologram;
- holographic mask;
41.Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision

机译：尖端和基于激光的纳米制剂可达100mm，具有亚纳米精度
- 作者：Ingo Ortlepp;Michael Kiihnel;Martin Hofmann;Laura Weidenfeller;Johannes Kirchner;Shraddha Supreeti;Rostyslav Mastylo;Mathias Holz;Thomas Michels;Roland Fuessl;Ivo W. Rangelow;Thomas Frohlich;Denis Dontsov;Christoph Schaffel;Eberhard Manske
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- nanofabrication;
- nanopositioning;
- sub-nanometre precision;
- tip-based patterning;
- laser based lithography;
- extended working area;
42.Design and fabrication of microlens array homogenizer for laser beam shaping using Two Photon Polymerization

机译：使用两个光子聚合的激光束整形的微透镜阵列均化器的设计与制造
- 作者：Jia-Rong Wu;Hua-Yi Ni;Chien-Chung Fu;Wei-Jei Peng;Ting-Ming Huang;Ming-Fu Chen
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- microlens array;
- homogenizer;
- two photon polymerization;
- flat-top laser beam shaper;
43.A new approach to removing H atoms in hydrogen depassivation lithography

机译：去除氢沉积光刻中H原子的新方法
- 作者：S. O. Reza Moheimani;Harried Alemansour
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- Scanning t unneling microscope;
- STM;
- Feedback controlled lithography;
- FCL;
- Hydrogen depassivation lithography;
- HDL;
44.Electron Beam Mask Writer EBM-8000P for High-throughput Mask Production

机译：电子束掩模编写器EBM-8000P用于高吞吐罩生产
- 作者：Tomohiro Iijima;Satoshi Nakahashi;Ryo Iikubo;Takahiro Honbu;Shinsuke Nishimura;Syoji Mori;Hirohiko Honda;Tsuyoshi Yamashita;Tetsurou Nishiyama;Osamu Kawami;Takao Tamura;Kenji Ohtoshi;Hirokazu Yamada
- 会议名称：《Conference on Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS》 | 2020年
- electron beam mask writer;
- throughput;
- CD uniformity;
- image placement;
- node;