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8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island

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1.Particle removal with pulsed-laser induced plasma over an extended area of a silicon wafer

机译：用脉冲激光诱导的等离子体在硅晶片的扩展区域上去除颗粒
- 作者：THOMAS HOOPER;JR.;CETIN CETINKAYA
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- particle removal;
- nanoparticles;
- laser-induced plasma;
2.Particle removal by collisions with energetic clusters

机译：与高能团簇碰撞而去除颗粒
- 作者：JULIUS PEREL;JOHN MAHONEY;PETER KOPALIDIS;ROB BECKER
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- surface cleaning;
- submicrometer particles;
- environmentally friendly;
- energetic clusters;
- SEM analysis;
3.Particle transport and adhesion in an ultra-clean ion-beam sputter deposition process

机译：超清洁离子束溅射沉积工艺中的颗粒传输和粘附
- 作者：C.C. WALTON;D.J. RADER;J.A. FOLTA;D.W. SWEENEY
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- particles;
- defects;
- optical coatings;
- EUVL;
- lithography;
- bounce;
- transport;
- ion drag;
- ion-beam;
- sputtering;
4.Surface and micro-analytical methods for particle identification

机译：用于颗粒识别的表面和微观分析方法
- 作者：DAVID A. COLE;JOHN HUMENANSKY;MARIUS KENDALL;PATRICK J. MCKEOWN;VASIL PAJCINI;JUERGEN H. SCHERER
- 会议名称：《》 | 2002年
- AES;
- EDS;
- ESCA;
- far-field spectroscopy;
- FT-IR;
- near-field spectroscopy;
- particle;
- raman spectroscopy;
- surface analysis;
- TOF-SIMS;
- XPS;
5.Possible post-CMP cleaning processes for STI ceria slurries

机译：STI二氧化铈浆料可能的CMP后清洗工艺
- 作者：ROBERT SMALL;BRANDON SCOTT
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- STI;
- ceria polishing;
- post-CMP cleaning;
- buffered chelating solutions;
- hydrogen peroxide;
6.The haze of a wafer: A new approach to monitor nano-sized particles

机译：晶圆的雾霾：一种监测纳米级颗粒的新方法
- 作者：K. XU;R. VOS;G. VEREECKE;M. LUX;W. FYEN;F. HOLSTEYNS;K. KENIS;P.W. MERTENS;M.M. HEYNS;C. VINCKIER
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- LPD;
- contamination;
- haze;
7.Modified SC-1 solutions for silicon wafer cleaning

机译：改进的SC-1解决方案，用于硅晶片清洁
- 作者：CHRISTOPHER BEAUDRY;JENNIFER BAKER;ROMAN GOUK;STEVEN VERHAVERBEKE
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- RCA clean;
- silicon wafer cleaning;
- chelating agent;
- surfactant;
- modified SC-1;
- particle removal;
8.Particle adhesion on nanoscale rough surfaces

机译：颗粒附着在纳米级粗糙表面上
- 作者：BRIJ M. MOUDGIL;YAKOV I. RABINOVICH;MADHAVAN S. ESAYANUR;RAJIV K. SINGH
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- adhesion;
- atomic force microscopy;
- nanoscale roughness;
- particles;
9.Effects of megasonics coupled with SC-1 process parameters on particle removal on 300-mm silicon wafers

机译：兆频超声与SC-1工艺参数对300毫米硅晶圆上颗粒去除的影响
- 作者：STEPHANIE L. WICKS;MATHEW S. LUCEY;JOHN J. ROSATO
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- particle removal;
- megasonics;
- SC-1;
- silicon wafer;
10.Development of a technique for glass cleaning in the course of demanufacturing of electronic products

机译：电子产品去制造过程中玻璃清洁技术的发展
- 作者：E.S. GESKIN;B. GOLDENBERG;R. CAUDILL
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- fluidized bed;
- cleaning;
- glass;
- fragments;
11.A new thermodynamic theory of adhesion of particles on surfaces

机译：颗粒在表面粘附的新热力学理论
- 作者：M.A. MELEHY
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- particle adhesion;
- surface charges;
- interfacial electrification;
- interfacial thermodynamics;
12.The ideal ultrasonic parameters for delicate parts cleaning

机译：理想的超声波参数，用于精细零件的清洁
- 作者：TIMOTHY PIAZZA;WILLIAM L. PUSKAS
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
13.The nature and characterization of small particles

机译：小颗粒的性质和表征
- 作者：RAJIV KOHLI
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- small particles;
- characterization;
- innovative imaging techniques;
- SNOM;
- atom probe;
- HAADF-STEM;
- raman microscopy;
- multiplexed multiphoton microscopy (MMM);
14.The use of rectangular jets for surface decontamination

机译：使用矩形喷嘴进行表面净化
- 作者：E.S. GESKIN;B. GOLDENBERG
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- cleaning;
- rectangular jets;
- surface processing;
15.The use of surfactants to reduce particulate contamination on surfaces

机译：使用表面活性剂减少表面上的颗粒污染
- 作者：MICHAEL L. FREE
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- surfactant;
- particle removal;
- interfacial forces;
- adsorption;
- decontamination;
16.Mechanics of nanoparticle adhesion ― A continuum approach

机译：纳米颗粒粘附的力学-连续方法
- 作者：JUERGEN TOMAS
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- powder;
- particle mechanics;
- contact behavior;
- constitutive models;
- adhesion force;
- nanoparticles;
17.Particle deposition from a carry-over layer during immersion rinsing

机译：浸入漂洗过程中从残留层中沉积出颗粒
- 作者：WIM FYEN;KAIDONG XU;RITA VOS;GUY VEREECKE;PAUL MERTENS;MARC HEYNS
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- diffusion;
- adsorption;
- evaporation;
- particle;
- rinsing;
- immersion;
18.Influences of various parameters on microparticles removal during laser surface cleaning

机译：各种参数对激光表面清洁过程中微粒去除的影响
- 作者：Y.F. LU;Y.W. ZHENG;L. ZHANG;B. LUKYANCHUYK;W.D. SONG;W.J. WANG
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- laser cleaning;
- particle removal;
- spherical particles;
- surface roughness;
19.Investigation of ozonated DI water in semiconductor wafer cleaning

机译：半导体晶圆清洗中臭氧化去离子水的研究
- 作者：JERRY DEBELLO;LEWIS LIU
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- ozonated DI;
- 0.085 μm particles;
- particle cleaning by DIO_3;
- (HF + DIO_3) mixture;
20.Ice-air blast cleaning: Case studies

机译：冰风吹扫清洁：案例研究
- 作者：D. SHISHKIN;E. GESKIN;B. GOLDENBERG;O. PETRENKO
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- ice-air blasting;
- ice particle production;
- derusting;
- depainting;
- graffiti removal;
- biomedi-cal applications;
21.Advanced wet cleaning of sub-micrometer sized particles

机译：高级湿清洁亚微米级颗粒
- 作者：R. VOS;K. XU;G. VEREECKE;F. HOLSTEYNS;W. FYEN;L. WANG;J. LAUERHAAS;M. HOFFMAN;T. HACKETT;P. MERTENS;M. HEYNS
- 会议名称：《8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; Jun 24-26, 2002; Providence, Rhode Island》 | 2002年
- particle removal efficiency;
- dilute HF;
- SC1;
- megasonic cleaning;
- etching;