Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing

摘要

Feasibility of uniform meters-scale high-density plasma production using LIA modules has been demonstrated on the basis of three-dimensional plasma simulation. Furthermore, plasma control methods are described for understanding and designing the meters-size/ultra-large-area and high-density RF plasma sources driven by inductive coupling with LIA modules. The results show that these type of ICP driven by the internal LIA unit are quite attractive as plasma sources for a variety of giant electronics processing.