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Realizing n-type doping and high carrier mobility of silicene by decamethylcobaltocene molecular adsorption

机译:通过甲基甲基甲基甲基双子分子吸附实现硅的N型掺杂和高载体迁移率

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摘要

In this work, the structural and electronic properties of silicene with decamethylcobaltocene (DMC) molecular doping are investigated by density functional theory to improve its semiconductor properties. DMC molecule with strong electron-donating ability is physisorbed on silicene. An interfacial charge transfer between silicene and DMC molecule occurs, then the location of Fermi energy is modulated lower than the Dirac point of silicene with 0.273 eV - 0.282 eV. Consequently, n-type doped silicene is realized. Meanwhile, a band gap of 0.024 eV 0.032 eV opens in silicene. Moreover, silicene maintains a high carrier concentration (3.426 x 1013 - 3.518 x 1013 cm-2) and carrier mobility (13.839 x 104 cm2 V-1 s- 1 for electrons and 5.428 x 104 cm2 V-1 s- 1 for holes) with anisotropy. This work opens possible applications of silicene in photonic and electronic devices.
机译:在这项工作中,通过密度函数理论研究了具有甲基甲基钴茂氢环(DMC)分子掺杂的硅的结构和电子性质,以改善其半导体性能。 具有强电子捐赠能力的DMC分子在硅上没有物质吸收。 发生硅和DMC分子之间的界面电荷转移,然后将FERMI能量的位置低于0.273eV-0.282 EV的硅的DIACAC点。 因此,实现了n型掺杂硅烯。 同时,0.024eV 0.032 EV的带隙在硅烯。 另外,硅素保持高载体浓度(3.426×1013-3.518×1013cm-2)和孔的载流子迁移率(13.839×10 4 cm 2 V-1 S-1,孔为5.428×104cm 2 V-1 s-1) 各向异性。 这项工作在光子和电子设备中打开了硅片的可能应用。

著录项

  • 来源
    《Thin Solid Films》 |2021年第30期|138691.1-138691.5|共5页
  • 作者单位

    Jilin Univ Coll Phys State Key Lab Superhard Mat Changchun 130012 Peoples R China;

    Jilin Univ Coll Phys State Key Lab Superhard Mat Changchun 130012 Peoples R China;

    Jilin Univ Coll Phys State Key Lab Superhard Mat Changchun 130012 Peoples R China;

    Jilin Univ Coll Phys State Key Lab Superhard Mat Changchun 130012 Peoples R China;

    Jilin Univ Coll Phys State Key Lab Superhard Mat Changchun 130012 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silicene; Molecular adsorption; n-type doping; Carrier mobility; Density functional theory;

    机译:硅片;分子吸附;n型掺杂;载流子迁移率;密度函数理论;

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