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首页> 外文期刊>Thin Solid Films >Temperature dependent Schottky barrier characteristics of Al-type Si Schottky barrier diode with Au-Cu phthalocyanine interlayer
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Temperature dependent Schottky barrier characteristics of Al-type Si Schottky barrier diode with Au-Cu phthalocyanine interlayer

机译:Al / N型Si肖特基势垒二极管温度依赖性肖特基势垒特性与Au-Cu酞菁层间

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摘要

The Al-type Si Schottky barrier diodes (SBDs) were prepared with Au-Cu phthalocyanine (Au-CuPc) interlayers with different Au and CuPc compositional ratios, probed their temperature dependent current-voltage (I-V) and low frequency noise properties. The Schottky barrier properties like barrier height and the ideality factor are strongly temperature dependent, implying the existence of Schottky barrier inhomogeneities. The barrier inhomogeneities was elucidated using thermionic emission theory based on the assumption of Gaussian distribution of the barrier heights. Further, a divergence in the barrier heights evaluated from the I-V characteristics and Norde's method indicates a deviation of the Al/Au-CuPc-type Si SBDs behavior from thermionic emission. The Richardson plot evaluated with the Gaussian distribution of barrier heights method yielded Richardson constant values close to theoretical Richardson constant of n-type Si. The room temperature current noise power spectral density (S-I) of the Al/Au-CuPc-type Si SBDs having various Au and CuPc concentrations showed a reciprocal of frequency (1/f)(gamma) behavior having gamma values near to unity. The decrease in S-I and gamma with increasing Au concentration in Au-CuPc interlayers was indicative of lessening barrier inhomogeneity. This was also correlated with the decrease in the value of standard deviation derived using temperature dependent I-V characteristics. Further investigations revealed that origins of 1/f noise could be associated with the fluctuations of barrier height and carrier mobility for Al/Au-CuPc-type Si SBDs with lower and higher Au compositions in Au-CuPc interlayers, respectively.
机译:使用具有不同AU和CUPC成分比的Au-Cu酞菁(Au-CupC)中间层制备Al / N型Si Schotkky屏障二极管(SBD),探测其温度相关的电流 - 电压(I-V)和低频噪声性能。肖特基势垒属性如屏障高度和理想因子依赖性强烈依赖,暗示肖特基势势不均匀的存在。基于对屏障高度的高斯分布的假设,使用热离子发射理论阐明了屏障不均匀性。此外,从I-V特性和Norde的方法评估的阻隔高度的分歧表示来自热离子发射的Al / Au-Cupc / n型Si Sbds行为的偏差。利用高斯屏障高度的高斯分布评估的理查森图占Richardson恒定值,接近N型Si的理论Richardson常数。具有各种AU和CUPC浓度的Al / Au-Cupc / N型Si Si Si Si Si的室温电流噪声功率谱密度(Si)显示出邻近统一附近的γ值的频率(1 / f)(γ)行为的往复运动。随着AU-CUPC中间层中增加Au浓度的S-I和γ的降低表明屏障不均匀性缩小。这也与使用温度依赖性I-V特性导出的标准偏差值的减少相关。进一步的研究表明,1 / F噪声的起源可以与Au-Cupc中间层中具有较低和更高的Au组合物的Al / Au-Cupc / n型Si SiSBD的屏障高度和载流子迁移率的波动相关。

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