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Indentation modulus and microstructural properties of Zirconia - Alumina -Magnesia composite thin films deposited by electron beam evaporation under varying oxygen pressure

机译:不同氧气压力下电子束蒸发沉积的氧化锆 - 氧化铝 - 氧化铝 - 氧化钛复合薄膜的压痕模量和微观结构性能

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摘要

Zirconia - Alumina - Magnesia (ZrO2Al2O3MgO) ternary composite thin films are used in the fabrication of interference multilayer thin film devices for lasers and photo-physical applications. Optical, structural and morphological properties of such thin films deposited under varying deposition parameters, are reported by researchers. Such thin films possess fascinating spectral stability and optical properties. However, reports on elastic properties that are crucial parameter to assess mechanical stability, are scanty for such thin films. In the present work, ZrO2Al2O3MgO thin films have been deposited by electron beam evaporation under varying oxygen (O-2) pressure. Atomic force acoustic microscopy, which is rather new technique, has been employed to estimate indentation modulus of the films. Indentation modulus exhibits a decreasing trend with deposition O-2 pressure. Film density measured by grazing incidence X-ray reflectivity, decreases monotonically with O-2 pressure. The variation of indentation modulus as well as density has been explained in terms of varying microstructure and mutual concentration of different components of ternary composite thin films. Correlation length, root mean square surface roughness and roughness exponents have been obtained through analysis of height-height correlation function measured by atomic force microscopy. Variation of correlation length corroborates the variation of indentation modulus and film density.
机译:氧化锆 - 氧化铝 - 氧化镁(ZrO2Al2O3MGO)三元复合薄膜用于制造用于激光器和光学物理应用的干扰多层薄膜装置。研究人员报告了在不同沉积参数下沉积的这种薄膜的光学,结构和形态学性质。这种薄膜具有迷人的光谱稳定性和光学性质。然而,关于评估机械稳定性的关键参数的弹性性能的报道是如此薄膜的稀释。在本作工作中,通过电子束蒸发在不同的氧气(O-2)压力下沉积ZrO2Al2O3MGO薄膜。原子力声学显微镜,其是相当新的技术,用于估计薄膜的缩进模量。压痕模量具有沉积O-2压力的降低趋势。通过放牧入射X射线反射率测量的膜密度,用O-2压力单调地减少。在不同组分的三元复合薄膜的不同组分的不同组织和相互浓缩方面,已经解释了压痕模量的变化以及密度。通过分析通过原子力显微镜测量的高度高度相关函数来获得相关长度,根均方表粗糙度和粗糙度指数。相关长度的变化证实了压痕模量和膜密度的变化。

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