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Engineering of sub-band in CuGaS_2 thin films via Mo doping by chemical spray pyrolysis route

机译:通过MO掺杂通过化学喷雾热解途径的Cugas_2薄膜子带的工程

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摘要

High quality undoped and molybdenum (Mo) doped CuGaS2 (CGS) crystalline thin films were deposited using in-house chemical spray pyrolysis thin film deposition unit. To improve the crystalline quality and prevent the oxidation, deposited thin films were subjected to annealing at various atmospheres (vacuum, nitrogen, and argon). The measured X-ray diffraction peaks were indexed to the standard chalcopyrite tetragonal structure and revealed that no identification of binary phases in the CGS system. Mo doping has strongly influenced the optical properties especially at the bandgaps of CGS thin films. The measured band gaps for undoped, 1%, 2% and 3% Mo-doped CGS thin films were found to be 2.40, 2.38, 2.35, and 2.65 eV, respectively. Interestingly, 1 and 2 wt% Mo-doped CGS thin films give additional characteristic band at 1.45 eV and 1.47 eV, and these could be due to the formation of sub-bandgap in between the conduction and valence band after doping. The photo-response of the prepared films has also been analyzed which demonstrates considerable photocurrent generation for the 1 and 2 wt% Mo-doped CGS thin films. The enhanced photoresponsivity reveals that Mo doped CGS thin films possess potential applications in solar energy utilization.
机译:使用内部化学喷雾热解薄膜沉积单元沉积高质量的未掺杂和钼(MO)掺杂的Cugas2(CGS)结晶薄膜。为了改善结晶质量并防止氧化,在各种大气(真空,氮气和氩气中,对沉积的薄膜进行退火。测量的X射线衍射峰被指定为标准的黄铜矿四方结构,并显示出CGS系统中没有二元相的鉴定。 Mo掺杂强烈影响光学性质,特别是在CGS薄膜的带盖处。未掺杂,1%,2%和3%Mo掺杂的CGS薄膜的测量带间隙分别为2.40,2.38,2.35和2.65eV。有趣的是,1和2wt%的Mo掺杂的CGS薄膜在1.45eV和1.47eV下提供额外的特征带,并且这些可能是由于在掺杂后导通和价带之间的子带隙的形成。还分析了制备薄膜的光响应,其表明了1和2wt%Mo掺杂的CGS薄膜的相当大的光电流产生。增强的光反对子显示揭示了Mo掺杂的CGS薄膜具有太阳能利用的潜在应用。

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