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The correlation between mechanical stress and magnetic properties of cobalt ultra thin films

机译:钴超薄膜的机械应力与磁性能的相关性

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摘要

In this study, a series of epitaxial Co ultrathin films sandwiched by Au has been grown by electron beam evaporation, onto glass substrates of two different thicknesses. The Co thickness varies from 1 to 3 nm for each series. The dependence of the magnetic anisotropy for the two series is consistent with the variation of the mechanical film stress. We compare the magnetic properties of both series. Stress measurements are performed, by electron diffraction and optical deflection techniques, to investigate the correlation between mechanical film stress and magnetic anisotropy.
机译:在这项研究中,通过电子束蒸发将一系列被Au夹在中间的Co外延Co超薄膜生长到两种不同厚度的玻璃基板上。每个系列的Co厚度从1到3 nm不等。两个系列的磁各向异性的相关性与机械膜应力的变化一致。我们比较两个系列的磁性能。通过电子衍射和光学偏转技术进行应力测量,以研究机械膜应力与磁各向异性之间的关系。

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