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首页> 外文期刊>Thin Solid Films >Structural properties of d.c. magnetron sputtered B-C-N thin films and correlation to their mechanical properties: a new empirical formula
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Structural properties of d.c. magnetron sputtered B-C-N thin films and correlation to their mechanical properties: a new empirical formula

机译:直流电的结构特性磁控溅射B-C-N薄膜及其与机械性能的关系:新的经验公式

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B-C-N thin films of a wide composition range were deposited by reactive d.c. magnetron sputtering from targets with different B/C ratio in an Ar/N-2 atmosphere. The films were investigated by electron diffraction (ED) and their mechanical properties hardness and Young's modulus were determined from nanoindentation. The diffraction pattern of most of the films gave evidence of an amorphous structure and the number and distance of nearest neighbours were calculated. The mechanical properties hardness and Young's modulus are correlated to the structural parameters. An empirical formula could be established that allows the calculation of hardness and Young's modulus when the composition of the film and the number and distance of nearest neighbours are known. In this formula, the percentage of each element (B,C and N) is included in a weighted sum that is close to the average valence electron number. (C) 2004 Elsevier B.V. All rights reserved.
机译:通过反应性d.c沉积具有宽组成范围的B-C-N薄膜。在Ar / N-2气氛中从具有不同B / C比的靶材进行磁控溅射。通过电子衍射(ED)研究薄膜,并通过纳米压痕确定其机械性能,硬度和杨氏模量。大多数薄膜的衍射图样提供了无定形结构的证据,并计算了最近邻的数量和距离。机械性能硬度和杨氏模量与结构参数相关。可以建立一个经验公式,当已知薄膜的成分以及最近邻的数量和距离时,可以计算硬度和杨氏模量。在该公式中,每种元素(B,C和N)的百分比都包含在接近平均价电子数的加权总和中。 (C)2004 Elsevier B.V.保留所有权利。

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