The effects of deposition and test conditions on nanomechanical behaviour of ultrathin films produced by plasma-enhanced chemical vapour deposition process at atmospheric pressure

摘要

Nanometer thick films have been deposited on silicon substrate by plasma-enhanced chemical vapour deposition (PE-CVD) process using non-homogenous, filamentary dielectric-barrier discharge (DBD) at atmospheric pressure. This film deposition technique enables the introduction some organic fragments into the coating material-silicon dioxide (or oxynitride)-resulting in good properties for self-lubrication of micro-electro-mechanical systems (MEMS) devices. The effect of the deposition conditions and loading rates on the hardness and the elasticity modulus of the films are presented in this paper. (C) 2004 Elsevier B.V. All rights reserved.