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Annealing dependence of optical properties of Ga_(20)S_(75)Sb_5 and Ga_(20)S_(40)Sb_(40) thin films

机译:Ga_(20)S_(75)Sb_5和Ga_(20)S_(40)Sb_(40)薄膜的光学特性的退火依赖性

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Amorphous Ga_(20)S_(75)Sb_5 and Ga_(20)S_(40)Sb_(40) thin films were prepared onto glass substrates by using thermal evaporation method. The effect of annealing (under vacuum) at different temperatures on the optical parameters was investigated in the temperature range 373-593 K. The optical absorption coefficient (α) for the as-deposited and annealed films were calculated from the reflectance and transmittance measurements in the range 190-900 nm. X-Ray diffraction indicates that the as-deposited films and those annealed up to the glass transition temperature (T_g) exhibit amorphous state. On annealing above the glass transition temperature these films show a polycrystalline structure. Analysis of the optical absorption data indicates that the optical band gap E_g~(opt) of these films obeys Tauc's relation for the allowed non-direct transition. It was found that the optical band gap E_g~(opt) increases with annealing temperature up to T_g, whereas above T_g there is a remarkable decrease. The obtained results were interpreted on the basis of amorphous- crystalline transformation.
机译:利用热蒸发法在玻璃基板上制备了非晶Ga_(20)S_(75)Sb_5和Ga_(20)S_(40)Sb_(40)薄膜。在373-593 K的温度范围内,研究了在不同温度下(真空)退火对光学参数的影响。沉积和退火后的薄膜的光吸收系数(α)由反射率和透射率的测量值计算得出。范围190-900 nm。 X射线衍射表明,所沉积的膜和退火至玻璃化转变温度(T_g)的膜呈现非晶态。在高于玻璃化转变温度的退火下,这些膜显示出多晶结构。对光吸收数据的分析表明,对于允许的非直接跃迁,这些膜的光学带隙E_g_(opt)服从Tauc关系。已经发现,随着退火温度达到T_g,光学带隙E_g〜(opt)增加,而在T_g以上,则明显降低。所获得的结果是根据无定形晶体转变来解释的。

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