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Characterisation of porous silicon composite material by spectroscopic ellipsometry

机译:椭圆偏振光谱法表征多孔硅复合材料

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Porous silicon materials are currently under intense investigation for optoelectronic applications. Spectroscopic ellipsometry (SE) was used to study the optical properties of layers of composite material composed by porous silicon and disperse red one (a red dye which is well known for its non-linear properties) in the UV-IR spectral range (0.75-4.5 eV). P-doped silicon substrate was first electrochemically etched in a dilute HF electrolyte solution in order to obtain porous silicon films. Then these films were oxidised to produce a thin (5 μm) transparent layer of SiO_2 on the silicon substrate with negligible optical anisotropy. After the oxidation, disperse red one (DR1) molecules diluted in a solution of THF (tetrahydrofurane) were introduced in the porous material. The DR1 is uniformly distributed inside the porous silica layer and the amount of dye was estimated by an effective medium approximation. The "orientation of the dye molecules was tested after poling by a static electrical field.
机译:多孔硅材料目前正受到光电子应用的广泛研究。椭圆偏振光谱法(SE)用于研究复合材料层的光学性能,该复合材料层由多孔硅构成,并在紫外-红外光谱范围(0.75- 4.5 eV)。为了获得多孔硅膜,首先在稀的HF电解质溶液中对P掺杂的硅衬底进行电化学蚀刻。然后将这些膜氧化以在硅基板上产生薄(5μm)的SiO_2透明层,且光学各向异性可以忽略不计。氧化后,将在THF(四氢呋喃)溶液中稀释的分散红一(DR1)分子引入多孔材料中。 DR1均匀地分布在多孔二氧化硅层内部,并且通过有效的介质近似来估计染料的量。在通过静电电场极化后,测试染料分子的取向。

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